发明授权
- 专利标题： Lithographic apparatus
- 专利标题（中）： 平版印刷设备
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申请号： US10840360申请日： 2004-05-07
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公开(公告)号： US07064807B2公开(公告)日： 2006-06-20
- 发明人: Cheng-Qun Gui , Henricus Wilhelmus Maria Van Buel , Maurits Van Der Schaar , Arie Jeffrey Den Boef
- 申请人： Cheng-Qun Gui , Henricus Wilhelmus Maria Van Buel , Maurits Van Der Schaar , Arie Jeffrey Den Boef
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman, LLP
- 优先权： EP01300302 20010115
- 主分类号： G03B27/54
- IPC分类号： G03B27/54 ; G03B27/42 ; G03B27/32 ; G01B11/00
摘要：
A lithographic projection apparatus is provided with an optical system built into the wafer table for producing an image of a wafer mark that is provided on the back side of the wafer. The image is located at the plane of the front side of the wafer and can be viewed by an alignment system from the front side of the wafer. Simultaneous alignment between marks on the back and front of the wafer and a mask can be performed using a pre-existing alignment system.
公开/授权文献
- US20040201833A1 Lithographic apparatus 公开/授权日：2004-10-14
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