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    Lithographic apparatus
    2.
    发明授权
    Lithographic apparatus 有权
    平版印刷设备

    公开(公告)号：US06768539B2

    公开(公告)日：2004-07-27

    申请号：US10043271

    申请日：2002-01-14

    申请人： Cheng-Qun Gui ,  Henricus Wilheimus Maria Van Buel ,  Maurits Van Der Schaar ,  Arie Jeffrey Den Boef

    发明人： Cheng-Qun Gui ,  Henricus Wilheimus Maria Van Buel ,  Maurits Van Der Schaar ,  Arie Jeffrey Den Boef

    IPC分类号： G03B2742

    CPC分类号： G03F7/70691 ,  G03F7/70216 ,  G03F9/7084

    摘要： A lithographic projection apparatus is provided with an optical system built into the wafer table for producing an image of a wafer mark that is provided on the back side of the wafer. The image is located at the plane of the front side of the wafer and can be viewed by an alignment system from the front side of the wafer. Simultaneous alignment between marks on the back and front of the wafer and a mask can be performed using a pre-existing alignment system

    摘要翻译： 光刻投影装置设置有内置在晶片台中的光学系统，用于产生设置在晶片背面的晶片标记的图像。 图像位于晶片正面的平面上，并且可以通过对准系统从晶片的正面观察。 可以使用预先存在的对准系统来执行晶片背面和前面的标记与掩模之间的同时对准

    Inspection apparatus and method for measuring a property of a substrate
    3.
    发明授权
    Inspection apparatus and method for measuring a property of a substrate 有权
    用于测量基板的性质的检查装置和方法

    公开(公告)号：US09235141B2

    公开(公告)日：2016-01-12

    申请号：US13186895

    申请日：2011-07-20

    申请人： Maurits Van Der Schaar ,  Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos ,  Andreas Fuchs ,  Martyn John Coogans ,  Hendrik Jan Hidde Smilde

    发明人： Maurits Van Der Schaar ,  Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos ,  Andreas Fuchs ,  Martyn John Coogans ,  Hendrik Jan Hidde Smilde

    IPC分类号： G03F7/20 ,  G01N21/95 ,  G01N21/956 ,  G03F9/00 ,  G01N21/47

    CPC分类号： G03F7/70633 ,  G01B2210/56 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/95607 ,  G03F7/70616 ,  G03F9/70

    摘要： An inspection apparatus measures a property of a substrate including a periodic structure. An illumination system provides a beam of radiation with an illumination profile including a plurality of illuminated portions. A radiation projector projects the beam of radiation onto the substrate. A detector detects radiation scattered from the periodic structure and separately detects first order diffracted radiation and at least one higher order of diffracted radiation of each of the illuminated portions. A processor determines the property of the substrate from the detected radiation. The plurality of illuminated portions are arranged such that first order diffracted radiation arising from one or more of the illuminated portions are not overlapped by zeroth order or first order diffracted radiation arising from any other of the illuminated portions. Furthermore, the plurality of illuminated portions are arranged such that first order diffracted radiation arising from the one or more of the illuminated portions are overlapped by at least one of the higher orders of diffracted radiation arising from any other of the illuminated portions.

    摘要翻译： 检查装置测量包括周期性结构的基板的性质。 照明系统提供具有包括多个照明部分的照明轮廓的辐射束。 辐射投影仪将辐射束投影到基板上。 检测器检测从周期性结构散射的辐射，并分别检测每个照明部分的一级衍射辐射和衍射辐射的至少一个高阶。 处理器根据检测到的辐射来确定衬底的性质。 多个照明部分被布置成使得从一个或多个被照射部分产生的一级衍射辐射不会被任何其他照明部分产生的零级或一级衍射辐射重叠。 此外，多个照明部分被布置成使得由一个或多个被照射部分产生的一阶衍射辐射与从任何其他照明部分产生的衍射辐射的较高阶数中的至少一个重叠。

    Lithographic apparatus and device manufacturing method using overlay measurement
    4.
    发明授权
    Lithographic apparatus and device manufacturing method using overlay measurement 有权
    平版印刷设备和使用重叠测量的设备制造方法

    公开(公告)号：US08264686B2

    公开(公告)日：2012-09-11

    申请号：US12390528

    申请日：2009-02-23

    申请人： Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos ,  Maurits Van Der Schaar ,  Stefan Carolus Jacobus Antonius Keij

    发明人： Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos ,  Maurits Van Der Schaar ,  Stefan Carolus Jacobus Antonius Keij

    IPC分类号： G01B11/00 ,  G03B27/42

    CPC分类号： G03B27/42 ,  G03F7/70633

    摘要： A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate includes a reference set of gratings provided in the substrate, the reference set including two reference gratings having line elements in a first direction and one reference grating having line elements in a second, perpendicular, direction. A measurement set of gratings is provided on top of the reference set of gratings, the measurement set comprising three measurement gratings similar to the reference gratings. Two of the measurement gratings are oppositely biased in the second direction relative to the respective reference gratings. An overlay measurement device is provided to measure asymmetry of the three gratings in the reference set and the measurement set, and to derive from the measured asymmetry the overlay in both the first and second direction.

    摘要翻译： 布置成将图案从图案形成装置转印到衬底上的光刻设备包括设置在衬底中的参考光栅组，该参考组包括在第一方向上具有线元件的两个参考光栅和在第二方向上具有线元件的一个参考光栅 ，垂直，方向。 光栅的测量组提供在参考光栅组的顶部，测量组包括与参考光栅相似的三个测量光栅。 两个测量光栅相对于各个参考光栅在第二方向上相反地偏置。 提供覆盖测量装置以测量参考组和测量组中的三个光栅的不对称性，并且从第一和第二方向上的测量的不对称性导出覆盖。