- 专利标题： System and method to improve image sensor sensitivity
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申请号： US10944243申请日： 2004-09-16
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公开(公告)号： US07071019B2公开(公告)日： 2006-07-04
- 发明人: Wei Zhang , Chian-Liang Lin , Jung-Chen Yang , Chia-Chun Hung , Shih-Min Liu
- 申请人： Wei Zhang , Chian-Liang Lin , Jung-Chen Yang , Chia-Chun Hung , Shih-Min Liu
- 申请人地址： TW Hsin-Chu
- 专利权人： Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人： Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人地址： TW Hsin-Chu
- 代理机构： Duane Morris LLP
- 主分类号： H01L21/00
- IPC分类号： H01L21/00
摘要：
A method is disclosed for forming at least one image sensor with improved sensitivity along with at least one transistor device. The method comprises forming at least a portion of the transistor device on a substrate, forming the image sensor by doping a predetermined area separated from the transistor device by a minimum predetermined distance, forming an etch stop layer for covering a contact area of the transistor device, removing at least a portion of the etch stop layer in the predetermined area for exposing the image sensor, and covering the image sensor and the transistor device by at least one transparent protection layer.
公开/授权文献
- US20060057759A1 System and method to improve image sensor sensitivity 公开/授权日：2006-03-16