发明授权
- 专利标题: Lithographic apparatus having a gas flushing device
- 专利标题(中): 具有气体冲洗装置的平版印刷设备
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申请号: US10852686申请日: 2004-05-25
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公开(公告)号: US07136142B2公开(公告)日: 2006-11-14
- 发明人: Marcel Beckers , Ronald Johannes Hultermans , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Nicolaas Franciscus Koppelaars , Jan-Marius Schotsman , Ronald Van Der Ham , Johannes Antonius Maria Martina Van Uijtregt
- 申请人: Marcel Beckers , Ronald Johannes Hultermans , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Nicolaas Franciscus Koppelaars , Jan-Marius Schotsman , Ronald Van Der Ham , Johannes Antonius Maria Martina Van Uijtregt
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 主分类号: G03B27/52
- IPC分类号: G03B27/52 ; G03B27/42
摘要:
A lithographic apparatus is disclosed. The apparatus includes an illumination system to provide a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the beam with a pattern in its cross-section. The apparatus also includes a gas flushing device for flushing a substantially laminar flow of gas across the beam of radiation and/or along a surface of an optical component. The gas flushing device includes a single gas outlet that has an inner rim at a downstream end of the gas outlet. The inner rim defines a total gas outlet area. The gas outlet is provided with a laminator that has an effective area out of which, in use, the substantially laminar flow of gas flows. The laminator effective area includes material that has laminator openings and is at least as large as the total gas outlet area.
公开/授权文献
- US20050264773A1 Lithographic apparatus having a gas flushing device 公开/授权日:2005-12-01