发明授权
- 专利标题: Method of preparing negative-working radiation-sensitive elements
- 专利标题(中): 制备负性辐射敏感元件的方法
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申请号: US11488588申请日: 2006-07-18
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公开(公告)号: US07175969B1公开(公告)日: 2007-02-13
- 发明人: Kevin B. Ray , Heidi M. Munnelly , Ting Tao , Kevin D. Wieland , Scott A. Beckley , Jianbing Huang
- 申请人: Kevin B. Ray , Heidi M. Munnelly , Ting Tao , Kevin D. Wieland , Scott A. Beckley , Jianbing Huang
- 申请人地址: US NY Rochester
- 专利权人: Eastman Kodak Company
- 当前专利权人: Eastman Kodak Company
- 当前专利权人地址: US NY Rochester
- 代理商 J. Lanny Tucker
- 主分类号: G03F7/028
- IPC分类号: G03F7/028 ; G03F7/033 ; G03F7/034 ; G03F7/085 ; G03F7/14
摘要:
A method of preparing negative-working, single-layer imageable elements improves their storage stability in a humid environment. The method includes enclosing the coated imageable elements in a water-impermeable sheet material that substantially inhibits the transfer of moisture to and from the imageable element. Such imageable elements include a radiation-sensitive composition that includes a radically polymerizable component, an initiator composition to provide radicals upon exposure to imaging radiation, a radiation absorbing compound, and a polymeric binder having poly(alkylene glycol) side chains.
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