Invention Grant
- Patent Title: Semiconductor memory device having high electrical performance and mask and photolithography friendliness
- Patent Title (中): 具有高电气性能和掩模和光刻友好性的半导体存储器件
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Application No.: US10918175Application Date: 2004-08-13
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Publication No.: US07176512B2Publication Date: 2007-02-13
- Inventor: Jung-Hyeon Lee , Gi-Sung Yeo , Doo-Hoon Goo , Woo-Sung Han
- Applicant: Jung-Hyeon Lee , Gi-Sung Yeo , Doo-Hoon Goo , Woo-Sung Han
- Applicant Address: KR Suwon-Si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-Si
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2003-0056712 20030816
- Main IPC: H01L27/108
- IPC: H01L27/108 ; H01L29/76 ; H01L29/94 ; H01L31/119

Abstract:
A semiconductor memory device comprises a plurality of rows, each row comprising a plurality of active regions arranged at a pitch wherein the active regions in adjacent rows are shifted with respect to each other by one half of the pitch, wherein a distance between each active region in a row is equal to a distance between active regions in adjacent rows.
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