发明授权
- 专利标题: Microelectronic device having disposable spacer
- 专利标题(中): 具有一次性隔离物的微电子器件
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申请号: US10728995申请日: 2003-12-05
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公开(公告)号: US07202172B2公开(公告)日: 2007-04-10
- 发明人: Bor-Wen Chan , Yu-I Wang , Han-Jan Tao
- 申请人: Bor-Wen Chan , Yu-I Wang , Han-Jan Tao
- 申请人地址: TW Hsin-Chu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsin-Chu
- 代理机构: Haynes and Boone, LLP
- 主分类号: H01L21/311
- IPC分类号: H01L21/311
摘要:
A method of manufacturing a microelectronic device comprising forming a patterned feature over a substrate and employing a fluorine-containing plasma source to deposit a conformal polymer layer over the patterned feature and the substrate. The polymer layer is etched to expose the patterned feature and a portion of the substrate, thereby forming polymer spacers on opposing sides of the patterned feature.
公开/授权文献
- US20050121750A1 Microelectronic device having disposable spacer 公开/授权日:2005-06-09
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