Invention Grant
- Patent Title: Method for manufacturing a piezoelectric resonator
- Patent Title (中): 制造压电谐振器的方法
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Application No.: US11094622Application Date: 2005-03-30
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Publication No.: US07240410B2Publication Date: 2007-07-10
- Inventor: Hajime Yamada , Masaki Takeuchi , Hideki Kawamura , Hiroyuki Fujino , Yukio Yoshino , Ken-ichi Uesaka , Tadashi Nomura , Daisuke Nakamura , Yoshimitsu Ushimi , Takashi Hayashi
- Applicant: Hajime Yamada , Masaki Takeuchi , Hideki Kawamura , Hiroyuki Fujino , Yukio Yoshino , Ken-ichi Uesaka , Tadashi Nomura , Daisuke Nakamura , Yoshimitsu Ushimi , Takashi Hayashi
- Applicant Address: JP Kyoto
- Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: Keating & Bennett, LLP
- Priority: JP2002-001329 20020108; JP2002-142350 20020517; JP2002-335120 20021119; JP2002-338036 20021121; JP2002-338037 20021121
- Main IPC: H04R17/00
- IPC: H04R17/00 ; H01L41/00

Abstract:
A piezoelectric thin film resonator having a stabilized temperature characteristic of resonant frequency, a method for manufacturing the same, and a communication apparatus using the piezoelectric thin film resonator are provided. The piezoelectric thin film resonator is provided with a substrate having an opening, first and second insulation films which are provided on one surface of the substrate while covering the opening and which primarily include SiO2 and Al2O3, respectively, Al2O3 having oxygen defect and being in an amorphous state, and a piezoelectric thin film which is provided on the second insulation film and is sandwiched between electrodes and which primarily includes ZnO.
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