发明授权
- 专利标题: Graphite heater for producing single crystal, apparatus for producing single crystal, and method for producing single crystal
- 专利标题(中): 用于制造单晶的石墨加热器,单晶的制造装置以及单晶的制造方法
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申请号: US10516347申请日: 2003-12-08
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公开(公告)号: US07258744B2公开(公告)日: 2007-08-21
- 发明人: Masahiro Sakurada , Izumi Fusegawa , Satoshi Soeta , Makoto Iida
- 申请人: Masahiro Sakurada , Izumi Fusegawa , Satoshi Soeta , Makoto Iida
- 申请人地址: JP Tokyo
- 专利权人: Shin-Etsu Handotai Co., Ltd.
- 当前专利权人: Shin-Etsu Handotai Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff & Berridge, PLC
- 优先权: JP2002-382291 20021227; JP2002-382307 20021227; JP2002-382317 20021227; JP2003-111694 20030416
- 国际申请: PCT/JP03/15655 WO 20031208
- 国际公布: WO2004/061166 WO 20040722
- 主分类号: C30B35/00
- IPC分类号: C30B35/00 ; C30B15/20
摘要:
The present invention discloses a graphite heater for producing a single crystal used when producing a single crystal by the Czochralski method which comprises at least a terminal part to which electric current is supplied and a cylindrical heat generating part by resistance heating and are provided so as to surround a crucible for containing a raw material melt wherein the heat generating part has heat generating slit parts formed by being provided with upper slits extending downward from the upper end and lower slits extending upwards from the lower end by turns, and a length of at least one slit of the upper slits differs from others and/or a length of at least one slit of the lower slits differs from others so that a heat generating distribution of the heat generating part may be changed. Thereby, there can be provided a graphite heater for producing a single crystal which makes it possible to produce a silicon single crystal with high productivity when the silicon single crystal is pulled in a predetermined defect-free region or a predetermined defect region.
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