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US07268042B2 Nonvolatile semiconductor memory and making method thereof 有权
非易失性半导体存储器及其制造方法

Nonvolatile semiconductor memory and making method thereof
Abstract:
A nonvolatile semiconductor memory device of a split gate structure having a gate of low resistance suitable to the arrangement of a memory cell array is provided. When being formed of a side wall spacer, a memory gate is formed of polycrystal silicon and then replaced with nickel silicide. Thus, its resistance can be lowered with no effect on the silicidation to the selection gate or the diffusion layer.
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