发明授权
- 专利标题: Semiconductor device and method of manufacturing the same
- 专利标题(中): 半导体装置及其制造方法
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申请号: US11316908申请日: 2005-12-27
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公开(公告)号: US07276744B2公开(公告)日: 2007-10-02
- 发明人: Kenichi Tanaka , Tomonori Tanoue , Hidetoshi Matsumoto , Hiroshi Ohta , Kazuhiro Mochizuki , Hiroyuki Uchiyama
- 申请人: Kenichi Tanaka , Tomonori Tanoue , Hidetoshi Matsumoto , Hiroshi Ohta , Kazuhiro Mochizuki , Hiroyuki Uchiyama
- 申请人地址: JP Tokyo
- 专利权人: Renesas Technology Corp.
- 当前专利权人: Renesas Technology Corp.
- 当前专利权人地址: JP Tokyo
- 代理机构: Miles & Stockbridge PC
- 优先权: JP2004-380502 20041228
- 主分类号: H01L29/33
- IPC分类号: H01L29/33 ; H01L31/109
摘要:
This invention is intended to provide an HBT capable of achieving, if the HBT is a collector-up HBT, the constriction of the emitter layer disposed directly under an external base layer, and reduction in base-emitter junction capacity, or if the HBT is an emitter-up HBT, reduction in base-collector junction capacity. For the collector-up HBT, window structures around the sidewalls of a collector are used to etch either the emitter layer disposed directly under the external base layer, or an emitter contact layer For the emitter-up HBT, window structures around the sidewalls of an emitter are used to etch either the collector layer disposed directly under the external base layer, or a collector contact layer. In both HBTs, the external base layer is supported by a columnar structure to ensure mechanical strength.
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