Invention Grant
- Patent Title: System and method for measuring displacement of a stage
- Patent Title (中): 测量舞台位移的系统和方法
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Application No.: US10623004Application Date: 2003-07-17
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Publication No.: US07283200B2Publication Date: 2007-10-16
- Inventor: Alex Ka Tim Poon , Leonard Wai Fung Kho , Toru Kawaguchi , Hisashi Tazawa , Saburo Kamiya , Yasuhiro Hidaka
- Applicant: Alex Ka Tim Poon , Leonard Wai Fung Kho , Toru Kawaguchi , Hisashi Tazawa , Saburo Kamiya , Yasuhiro Hidaka
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agent Steven G. Roeder
- Main IPC: G03B27/42
- IPC: G03B27/42

Abstract:
A measurement system (222) for measuring the position of a stage (248) along a first axis includes a first system (260) having a first beam source (260A) that directs a first beam (260H) on a first path that is parallel with a second axis and a first redirector (260D) that redirects the first beam so that the redirected first beam (260H) is on a first redirected path that is parallel with the first axis irrespective to the orientation of the first redirector (260D) about a third axis. The measurement system (222) can include a shield (380) that protects the first beam (260H) from environmental conditions.
Public/Granted literature
- US20050012918A1 System and method for measuring displacement of a stage Public/Granted day:2005-01-20
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