公开(公告)号：US20120013861A1

公开(公告)日：2012-01-19

申请号：US13137964

申请日：2011-09-22

申请人： Alex Ka Tim Poon ,  Leonard Wai Fung Kho

发明人： Alex Ka Tim Poon ,  Leonard Wai Fung Kho

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： An apparatus and method provide fluid for immersion lithography. A nozzle member that can move in a direction, is arranged to encircle a space under the optical element. The nozzle member can have an input to supply the immersion liquid to the space under the optical element during the exposure, and an output to remove the immersion liquid from a gap between the nozzle member and the wafer during the exposure. Immersion liquid can be supplied at a first rate to the space from a first portion of the nozzle member and at a second rate to the space from a second portion during the exposure. A wafer substrate is exposed by light through the immersion liquid.

摘要翻译： 一种设备和方法为浸没式光刻提供流体。 可以沿一个方向移动的喷嘴构件被布置成围绕光学元件下方的空间。 喷嘴构件可以具有用于在曝光期间将浸没液体供应到光学元件下方的空间的输入，以及在曝光期间从喷嘴构件和晶片之间的间隙移除浸没液体的输出。 浸入液体可以以第一速率从喷嘴构件的第一部分以第二速率从曝光中的第二部分以第二速率供应到空间。 晶片衬底通过浸没液体被光照射。

公开(公告)号：US08068209B2

公开(公告)日：2011-11-29

申请号：US12073783

申请日：2008-03-10

申请人： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Guarav Keswani ,  Derek Coon

发明人： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Guarav Keswani ,  Derek Coon

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341

摘要： An immersion lithography tool with a diverter element, positioned between the immersion element and the substrate, for altering the “footprint” or shape of the meniscus of the body of immersion liquid between the last optical element and an immersion element on one side, and the substrate on the other side when the substrate is moved. The apparatus includes a substrate holder to hold the substrate having an imaging surface and a projection optical system having a last optical element. The projection optical system projects an image onto a target imaging area on the substrate through the immersion liquid filled in a gap between the imaging surface of the substrate and the last optical element. An immersion element maintains the immersion fluid in the gap. The diverter element is positioned between the immersion element and the substrate. The diverter element alters the footprint shape of the meniscus of the body of immersion liquid, thereby preventing or reducing the amount of leakage from a space between the substrate and the immersion element.

摘要翻译： 浸没式光刻工具，其具有位于浸没元件和基底之间的转向元件，用于改变在最后的光学元件与一侧的浸没元件之间的浸没液体的弯液面的“占地”或形状，以及 当基板移动时在另一侧的基板。 该装置包括用于保持具有成像表面的基板的基板保持器和具有最后光学元件的投影光学系统。 投影光学系统通过填充在基板的成像表面和最后一个光学元件之间的间隙中的浸渍液体将图像投影到基板上的目标成像区域上。 浸没元件将浸没液保持在间隙中。 分流器元件位于浸没元件和基底之间。 分流器元件改变浸没液体的弯液面的足迹形状，从而防止或减少从基板和浸没元件之间的空间的泄漏量。

公开(公告)号：US20100220301A1

公开(公告)日：2010-09-02

申请号：US12691173

申请日：2010-01-21

申请人： Alex Ka Tim POON ,  Leonard Wai Fung KHO ,  Derek COON ,  Gaurav KESWANI

发明人： Alex Ka Tim POON ,  Leonard Wai Fung KHO ,  Derek COON ,  Gaurav KESWANI

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： An immersion liquid confinement apparatus confines an immersion liquid in an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system. The apparatus also recovers the immersion liquid from the immersion area. The apparatus includes a confinement member and a liquid-permeable member. The confinement member includes an outlet and an aperture through which a patterned image is projected onto the object. The liquid-permeable member covers the outlet and has a first surface that faces the object and a second surface opposite the first surface, the second surface contacting a chamber. The confinement member includes at least one liquid inlet within the chamber through which a liquid is introduced into the chamber to reduce liquid from becoming stagnated within the chamber.

摘要翻译： 浸没液体限制装置将浸没液体限制在浸没式光刻系统中包括投影系统和曝光对象之间的间隙的浸没区域中。 该设备还从浸没区域中恢复浸没液体。 该装置包括限制构件和液体可渗透构件。 限制构件包括出口和孔，将图案化图像投射到物体上。 液体渗透部件覆盖出口并且具有面向物体的第一表面和与第一表面相对的第二表面，第二表面接触室。 所述限制构件包括在所述腔室内的至少一个液体入口，通过所述至少一个液体入口将液体引入所述腔室中以减少液体停滞在所述腔室内。

公开(公告)号：US07283200B2

公开(公告)日：2007-10-16

申请号：US10623004

申请日：2003-07-17

申请人： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Toru Kawaguchi ,  Hisashi Tazawa ,  Saburo Kamiya ,  Yasuhiro Hidaka

发明人： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Toru Kawaguchi ,  Hisashi Tazawa ,  Saburo Kamiya ,  Yasuhiro Hidaka

IPC分类号： G03B27/42

CPC分类号： G03F7/70775

摘要： A measurement system (222) for measuring the position of a stage (248) along a first axis includes a first system (260) having a first beam source (260A) that directs a first beam (260H) on a first path that is parallel with a second axis and a first redirector (260D) that redirects the first beam so that the redirected first beam (260H) is on a first redirected path that is parallel with the first axis irrespective to the orientation of the first redirector (260D) about a third axis. The measurement system (222) can include a shield (380) that protects the first beam (260H) from environmental conditions.

摘要翻译： 用于测量载物台（248）沿着第一轴线的位置的测量系统（222）包括第一系统（260），该第一系统（260）具有第一光束源（260A），该第一光束源引导第一光束（260H） 与第二轴平行，并且第一重定向器（260D）重定向第一光束，使得重定向的第一光束（260H）在与第一轴平行的第一重定向路径上，而与第一重定向器 （260D）围绕第三轴线。 测量系统（222）可以包括保护第一光束（260H）免受环境条件影响的屏蔽（380）。

公开(公告)号：US08934080B2

公开(公告)日：2015-01-13

申请号：US13617251

申请日：2012-09-14

申请人： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Derek Coon ,  Gaurav Keswani

发明人： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Derek Coon ,  Gaurav Keswani

IPC分类号： G03F7/20

CPC分类号： G03F7/70341

摘要： An immersion lithography apparatus includes a projection system having a final optical element, a movable stage that is movable below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap, a liquid confinement member and a liquid diverter. The liquid confinement member maintains the immersion liquid in the gap, and includes a liquid recovery portion that faces the stage surface and recovers liquid from the gap. The liquid recovery portion includes a first porous portion through which a first suction force is applied and a second porous portion through which a second suction force less than the first suction force is applied, the second portion being located outward of the first portion. The liquid diverter is positioned between the stage and at least the first porous portion.

公开(公告)号：US08780323B2

公开(公告)日：2014-07-15

申请号：US13064232

申请日：2011-03-11

申请人： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Gaurav Keswani

发明人： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Gaurav Keswani

IPC分类号： G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70925 ,  G03B27/42 ,  G03F7/70341 ,  G03F7/70725

摘要： Immersion fluid remaining on a portion of a substrate after that portion has passed an immersion nozzle is removed by moving the substrate relative to an immersion nozzle so that the portion of the substrate on which the immersion fluid remains is passed by the immersion nozzle again. A path is determined along which the substrate is to be moved to remove the remaining immersion fluid. The path can be determined based upon previous movements of the substrate, including factors such as the speed and/or length of the previous movements. Alternatively, portions of the substrate on which immersion fluid remains can be detected, and then the substrate can be moved so that the portion of the substrate on which the immersion fluid remains is passed by the immersion nozzle based on the results of the detection. Immersion fluid also can be removed from the stage surface located beyond the substrate.

摘要翻译： 通过移动衬底相对于浸入式喷嘴使基板的剩余部分已经通过浸入式喷嘴的方式残留在基板的一部分上的浸入流体，使得残留有浸没流体的基板部分再次被浸入式喷嘴通过。 确定要移动衬底以移除剩余浸没流体的路径。 该路径可以基于先前的基底移动来确定，包括先前移动的速度和/或长度等因素。 或者，可以检测浸入液体残留的基板的部分，然后基于检测结果，移动基板以使浸没流体保留的基板的部分通过浸渍喷嘴。 浸没流体也可以从位于基底之外的载物台表面除去。

公开(公告)号：US08477284B2

公开(公告)日：2013-07-02

申请号：US12573356

申请日：2009-10-05

申请人： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Derek Coon

发明人： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Derek Coon

IPC分类号： G03B27/52 ,  G03B27/32 ,  G03B27/68 ,  G03B27/42 ,  G03B27/54 ,  G03B27/58

CPC分类号： G03F7/70341 ,  G03B27/52

摘要： An immersion liquid confinement apparatus confines an immersion liquid in an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system. The apparatus also recovers the immersion liquid from the immersion area. The apparatus includes a confinement member and first and second liquid-permeable members. The confinement member includes an outlet and an aperture through which a patterned image is projected onto the object. The first liquid-permeable member covers the outlet and has a first surface that faces the object and a second surface opposite the first surface, the second surface contacting a first chamber. The second liquid-permeable member has first and second oppositely-facing surfaces, the first surface of the second liquid-permeable member contacts the first chamber, the second surface of the second liquid-permeable member contacts a second chamber that is different from the first chamber.

摘要翻译： 浸没液体限制装置将浸没液体限制在浸没式光刻系统中包括投影系统和曝光对象之间的间隙的浸没区域中。 该设备还从浸没区域中恢复浸没液体。 该装置包括限制构件和第一和第二液体可渗透构件。 限制构件包括出口和孔，将图案化图像投射到物体上。 第一透液性构件覆盖出口，并且具有面向物体的第一表面和与第一表面相对的第二表面，第二表面接触第一腔室。 第二透液性构件具有第一和第二相对面的表面，第二透液性构件的第一表面接触第一腔室，第二透液构件的第二表面接触与第一液体可渗透构件不同的第二腔室 房间。

公开(公告)号：US20100097585A1

公开(公告)日：2010-04-22

申请号：US12573356

申请日：2009-10-05

申请人： Alex Ka Tim POON ,  Leonard Wai Fung KHO ,  Derek COON

发明人： Alex Ka Tim POON ,  Leonard Wai Fung KHO ,  Derek COON

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03B27/52

摘要： An immersion liquid confinement apparatus confines an immersion liquid in an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system. The apparatus also recovers the immersion liquid from the immersion area. The apparatus includes a confinement member and first and second liquid-permeable members. The confinement member includes an outlet and an aperture through which a patterned image is projected onto the object. The first liquid-permeable member covers the outlet and has a first surface that faces the object and a second surface opposite the first surface, the second surface contacting a first chamber. The second liquid-permeable member has first and second oppositely-facing surfaces, the first surface of the second liquid-permeable member contacts the first chamber, the second surface of the second liquid-permeable member contacts a second chamber that is different from the first chamber.

摘要翻译： 浸没液体限制装置将浸没液体限制在浸没式光刻系统中包括投影系统和曝光对象之间的间隙的浸没区域中。 该设备还从浸没区域中恢复浸没液体。 该装置包括限制构件和第一和第二液体可渗透构件。 限制构件包括出口和孔，将图案化图像投射到物体上。 第一透液性构件覆盖出口，并且具有面向物体的第一表面和与第一表面相对的第二表面，第二表面接触第一腔室。 第二透液性构件具有第一和第二相对面的表面，第二透液性构件的第一表面接触第一腔室，第二透液构件的第二表面接触与第一液体可渗透构件不同的第二腔室 房间。

公开(公告)号：US20090237631A1

公开(公告)日：2009-09-24

申请号：US12379419

申请日：2009-02-20

申请人： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Derek Coon ,  Gaurav Keswani

发明人： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Derek Coon ,  Gaurav Keswani

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： An immersion lithography apparatus includes a projection system having a final optical element, a movable stage that is movable below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap, a liquid confinement member and a liquid diverter. The liquid confinement member maintains the immersion liquid in the gap, and includes a liquid recovery portion that faces the stage surface and recovers liquid from the gap. The liquid recovery portion includes a first porous portion through which a first suction force is applied and a second porous portion through which a second suction force less than the first suction force is applied, the second portion being located outward of the first portion. The liquid diverter is positioned between the stage and at least the first porous portion.

摘要翻译： 浸没式光刻设备包括具有最终光学元件的投影系统，在投影系统下方可移动的可移动平台，使得在最终光学元件与台面的表面之间存在间隙，浸没液体填充在间隙中， 液体限制构件和液体分配器。 液体限制部件将浸没液体保持在间隙中，并且包括面向台面的液体回收部，并从间隙回收液体。 液体回收部分包括施加第一吸力的第一多孔部分和施加小于第一吸力的第二吸力的第二多孔部分，第二部分位于第一部分的外侧。 液体转向器位于台架和至少第一多孔部分之间。

公开(公告)号：US20090231560A1

公开(公告)日：2009-09-17

申请号：US12382100

申请日：2009-03-09

申请人： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Derek Coon ,  Gaurav Keswani ,  Daishi Tanaka

发明人： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Derek Coon ,  Gaurav Keswani ,  Daishi Tanaka

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03B27/52

摘要： An immersion lithography apparatus includes a projection system having a final optical element and a stage that is movable to a position below the projection system such that a gap exists between the final optical element and a surface of the stage. An immersion liquid fills the gap between the surface and the final optical element. A liquid confinement member maintains the immersion liquid in the gap. The immersion liquid has a meniscus where the liquid contacts ambient gas, the meniscus defining a footprint of an immersion area. A movable liquid diverter is positioned between the liquid confinement member and the stage. The movable liquid diverter moves relative to the liquid confinement member in a direction parallel to the surface of the stage, and includes an opening that surrounds the immersion area, the opening contacting or being slightly spaced from the immersion area when the stage is stationary.

摘要翻译： 浸没光刻设备包括具有最终光学元件的投影系统和可移动到投影系统下方的位置的台架，使得在最终光学元件与台面的表面之间存在间隙。 浸没液体填充表面和最终光学元件之间的间隙。 液体限制构件将浸没液体保持在间隙中。 浸没液体具有弯液面，其中液体接触环境气体，弯月面限定了浸没区域的覆盖区域。 可移动的液体转向器位于液体限制构件和载物台之间。 可移动液体分配器在平行于载物台表面的方向上相对于液体限制构件移动，并且包括围绕浸没区域的开口，当平台静止时，开口接触或与浸没区域稍微间隔开。