发明授权
US07288155B2 Method for the rapid thermal control of a work piece in liquid or supercritical fluid 失效
液体或超临界流体中工件快速热控制的方法

Method for the rapid thermal control of a work piece in liquid or supercritical fluid
摘要:
A method for cleaning a semiconductor structure including providing a chamber for holding the semiconductor structure and a dense phase fluid, providing a thermal transfer device having a thermal transfer surface, connecting the thermal transfer device to the chamber, placing the semiconductor structure in the chamber in contact with the thermal transfer surface and thermally cycling the thermal transfer surface.
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