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US07315038B2 Methods and systems for positioning a laser beam spot relative to a semiconductor integrated circuit using a processing target as an alignment target 有权
用于使用处理对象作为对准目标相对于半导体集成电路定位激光束点的方法和系统

Methods and systems for positioning a laser beam spot relative to a semiconductor integrated circuit using a processing target as an alignment target
摘要：
A method and system position a laser beam spot relative to a semiconductor substrate having structures on or within the semiconductor substrate to be selectively processed by delivering a processing laser beam to a processing laser beam spot. The method generates a metrology laser beam and propagates the metrology laser beam along a propagation path to a metrology laser beam spot on or near a structure to be selectively processed. The method detects a reflection of the metrology laser beam from the structure, thereby generating a reflection signal, and determining, based on the reflection signal, a position of the metrology laser beam spot relative to the structure.
摘要（中）：

一种方法和系统将激光束点相对于在半导体衬底上或半导体衬底内具有结构的半导体衬底定位，以通过将处理激光束传送到处理激光束点来选择性地处理。 该方法产生计量激光束，并将测量激光束沿着传播路径传播到要选择性处理的结构上或附近的计量激光束点。 该方法检测来自结构的计量激光束的反射，从而产生反射信号，并且基于反射信号确定计量激光束点相对于该结构的位置。

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