发明授权
- 专利标题: Positive working resist composition
- 专利标题(中): 积极的工作抗拒组成
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申请号: US10791559申请日: 2004-03-03
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公开(公告)号: US07326513B2公开(公告)日: 2008-02-05
- 发明人: Shoichiro Yasunami , Koji Shirakawa , Kazuyoshi Mizutani
- 申请人: Shoichiro Yasunami , Koji Shirakawa , Kazuyoshi Mizutani
- 申请人地址: JP Tokyo
- 专利权人: FUJIFILM Corporation
- 当前专利权人: FUJIFILM Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Sughrue Mion, Pllc.
- 优先权: JPP.2003-058732 20030305
- 主分类号: G03F7/004
- IPC分类号: G03F7/004 ; G03F7/039
摘要:
A positive working resist composition comprising (A1) a resin containing a repeating unit represented by formula (1) defined in the specification and a repeating unit represented by formula (2) defined in the specification and having a property of being insoluble or sparingly soluble in an alkali developing solution and becoming soluble in an alkali developing solution by the action of an acid, and (B) a compound capable of generating sulfonic acid upon irradiation with active rays or radiations in an amount of from 5 to 20% by weight based on the total solid content of the positive working resist composition.
公开/授权文献
- US20040175654A1 Positive working resist composition 公开/授权日:2004-09-09
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