发明授权
- 专利标题： Phase measuring method and apparatus for measuring characterization of optical thin films
- 专利标题（中）： 用于测量光学薄膜表征的相位测量方法和装置
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申请号： US11264044申请日： 2005-11-02
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公开(公告)号： US07327467B2公开(公告)日： 2008-02-05
- 发明人: Seiji Takeuchi , Akiyoshi Suzuki , Minoru Yoshii
- 申请人： Seiji Takeuchi , Akiyoshi Suzuki , Minoru Yoshii
- 申请人地址： JP Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JP Tokyo
- 代理机构： Morgan & Finnegan LLP
- 优先权： JP2002-024469 20020131; JP2002-024471 20020131
- 主分类号： G01B11/02
- IPC分类号： G01B11/02 ; G01B9/02
摘要：
A phase measuring apparatus for measuring phase characteristics of a film applied onto an object to be measured includes a shearing interference system for providing incident light onto the object or light reflected on the object with shearing interference, a detector for detecting shearing interference information, and a computing unit for calculating the phase characteristics of the film based on the shearing interference information.
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