公开(公告)号：US07030998B2

公开(公告)日：2006-04-18

申请号：US10356231

申请日：2003-01-31

申请人： Seiji Takeuchi ,  Akiyoshi Suzuki ,  Minoru Yoshii

发明人： Seiji Takeuchi ,  Akiyoshi Suzuki ,  Minoru Yoshii

IPC分类号： G01B9/02

CPC分类号： G03F7/706 ,  G01J9/0215

摘要： A phase measuring apparatus for measuring phase characteristics of a film applied onto an object to be measured includes a shearing interference system for providing incident light onto the object or light reflected on the object with shearing interference, a detector for detecting shearing interference information, and a computing unit for calculating the phase characteristics of the film based on the shearing interference information.

摘要翻译： 用于测量施加到待测物体上的膜的相位特性的相位测量装置包括用于将入射光提供到物体上的剪切干涉系统或者具有剪切干涉的物体上反射的光，用于检测剪切干扰信息的检测器和 计算单元，用于基于剪切干扰信息计算胶片的相位特性。

公开(公告)号：US07327467B2

公开(公告)日：2008-02-05

申请号：US11264044

申请日：2005-11-02

申请人： Seiji Takeuchi ,  Akiyoshi Suzuki ,  Minoru Yoshii

发明人： Seiji Takeuchi ,  Akiyoshi Suzuki ,  Minoru Yoshii

IPC分类号： G01B11/02 ,  G01B9/02

CPC分类号： G03F7/706 ,  G01J9/0215

摘要： A phase measuring apparatus for measuring phase characteristics of a film applied onto an object to be measured includes a shearing interference system for providing incident light onto the object or light reflected on the object with shearing interference, a detector for detecting shearing interference information, and a computing unit for calculating the phase characteristics of the film based on the shearing interference information.

摘要翻译： 用于测量施加到待测物体上的膜的相位特性的相位测量装置包括用于将入射光提供到物体上的剪切干涉系统或者具有剪切干涉的物体上反射的光，用于检测剪切干扰信息的检测器和 计算单元，用于基于剪切干扰信息计算胶片的相位特性。

公开(公告)号：US20060055940A1

公开(公告)日：2006-03-16

申请号：US11264044

申请日：2005-11-02

申请人： Seiji Takeuchi ,  Akiyoshi Suzuki ,  Minoru Yoshii

发明人： Seiji Takeuchi ,  Akiyoshi Suzuki ,  Minoru Yoshii

IPC分类号： G01B9/02

CPC分类号： G03F7/706 ,  G01J9/0215

摘要： A phase measuring apparatus for measuring phase characteristics of a film applied onto an object to be measured includes a shearing interference system for providing incident light onto the object or light reflected on the object with shearing interference, a detector for detecting shearing interference information, and a computing unit for calculating the phase characteristics of the film based on the shearing interference information.

摘要翻译： 用于测量施加到待测物体上的膜的相位特性的相位测量装置包括用于将入射光提供到物体上的剪切干涉系统或者具有剪切干涉的物体上反射的光，用于检测剪切干扰信息的检测器和 计算单元，用于基于剪切干扰信息计算胶片的相位特性。

公开(公告)号：US5750294A

公开(公告)日：1998-05-12

申请号：US685464

申请日：1996-07-24

申请人： Masanobu Hasegawa ,  Minoru Yoshii ,  Seiji Takeuchi

发明人： Masanobu Hasegawa ,  Minoru Yoshii ,  Seiji Takeuchi

IPC分类号： G03B27/72 ,  G03F7/20 ,  G03F7/207 ,  G03F7/22 ,  G03F9/00 ,  G03F9/02 ,  H01L21/027

CPC分类号： G03F7/70558 ,  G03F7/70241 ,  G03F7/70591 ,  G03F7/70641

摘要： Disclosed is a method of determining a best focus position or best exposure amount of a projection lens in an arrangement wherein a reticle is placed on a plane perpendicular to an optical axis of the projection lens, wherein a pattern having periodicity in a predetermined direction is provided on a surface of the reticle, wherein the pattern is transferred to a photosensitive substrate by the projection lens to form a printed pattern thereon. The method includes providing the pattern by using a plurality of zigzag openings of a constant line width, extending in a direction perpendicular to the predetermined direction and being arrayed with a constant periodicity along that direction, transferring the pattern to the photosensitive substrate sequentially with different focus positions to form plural printed patterns thereon, imaging the printed patterns upon an image pickup surface of photoelectrically converting means; calculating, from an imagewise signal produced by the photoelectrically converting means, information related to one frequency component of zigzag lines, constituting an outline of an image of the zigzag opening, and determining the best focus position on the basis of the information.

摘要翻译： 公开了一种确定投影透镜的最佳聚焦位置或最佳曝光量的方法，其中将掩模版放置在垂直于投影透镜的光轴的平面上，其中提供了沿预定方向具有周期性的图案 在掩模版的表面上，其中通过投影透镜将图案转印到感光基板上，以在其上形成印刷图案。 该方法包括通过使用在垂直于预定方向的方向上延伸的恒定线宽度的多个之字形开口来提供图案，并沿着该方向以恒定的周期排列，以不同的焦点依次传送图案到感光基片 在其上形成多个印刷图案的位置，将印刷图案成像在光电转换装置的图像拾取表面上; 根据由光电转换装置产生的成像信号，计算与Z字形线的一个频率分量有关的信息，构成Z字形开口的图像的轮廓，并根据该信息确定最佳对焦位置。

公开(公告)号：US06714302B2

公开(公告)日：2004-03-30

申请号：US09330157

申请日：1999-06-11

申请人： Akiyoshi Suzuki ,  Minoru Yoshii

发明人： Akiyoshi Suzuki ,  Minoru Yoshii

IPC分类号： G03B2752

CPC分类号： G03F7/70466

摘要： A wafer having a plurality of areas is subjected to multiple exposures or a stitching exposure with a plurality of mask patterns being interchanged. A plurality of wafers are sequentially exposed to the plurality of mask patterns, with one wafer being replaced with a next wafer. When the one wafer is replaced with the next wafer, the next wafer is exposed to the mask pattern last used, prior to the replacement. When one mask pattern is interchanged with a next mask pattern, an area of the one wafer, last exposed to the one mask pattern, is first exposed to the next mask pattern.

摘要翻译： 具有多个区域的晶片经受多次曝光或缝合曝光，多个掩模图案被互换。 多个晶片顺序地暴露于多个掩模图案，其中一个晶片被替换为下一个晶片。 当一个晶片被下一个晶片替代时，在更换之前，下一个晶片暴露于最后使用的掩模图案。 当一个掩模图案与下一个掩模图案交换时，首先暴露于一个掩模图案的一个晶片的区域暴露于下一个掩模图案。

公开(公告)号：US5861952A

公开(公告)日：1999-01-19

申请号：US984509

申请日：1992-12-02

申请人： Toshihiko Tsuji ,  Kyoichi Miyazaki ,  Seiji Takeuchi ,  Minoru Yoshii ,  Noriyuki Nose

发明人： Toshihiko Tsuji ,  Kyoichi Miyazaki ,  Seiji Takeuchi ,  Minoru Yoshii ,  Noriyuki Nose

IPC分类号： G01N21/94 ,  G01B9/02 ,  G01N21/88

CPC分类号： G01N21/94

摘要： A light source portion having an acousto-optic element produces a laser beam of two light components having a frequency difference .DELTA.w and having registered polarization directions. The laser beam is subsequently divided by a half mirror. One of the divided laser beams is detected by a photoelectric detector as reference light, and a corresponding signal is applied to a synchronism detector. The other laser beam is projected by a scanning optical system to the surface of, e.g., an original to be examined to scan the same. At the position on the surface irradiated by the scanning light spot, the laser beam is modulated at a beat frequency .DELTA.w on the basis of optical heterodyne interference. A synchronism detector detects a signal corresponding to the scattered light from a particle or defect on the surface being examined, in synchronism with the frequency of the reference light, whereby the particle or defect can be detected with a good signal-to-noise ratio.

摘要翻译： 具有声光元件的光源部分产生具有频差DELTA w并具有记录的偏振方向的两个光分量的激光束。 激光束随后被半反射镜分开。 其中一个激光束被光电检测器作为参考光检测，相应的信号被施加到同步检测器。 另一个激光束由扫描光学系统投影到例如要检查的原件的表面以扫描它。 在由扫描光点照射的表面上的位置处，基于光学外差干扰以激光束以拍频DELTA w进行调制。 同步检测器与参考光的频率同步地检测与被检查的表面上的颗粒或缺陷相对应的散射光的信号，从而可以以良好的信噪比检测颗粒或缺陷。

公开(公告)号：US5610715A

公开(公告)日：1997-03-11

申请号：US412309

申请日：1995-03-29

申请人： Minoru Yoshii ,  Kyoichi Miyazaki ,  Seiji Takeuchi

发明人： Minoru Yoshii ,  Kyoichi Miyazaki ,  Seiji Takeuchi

IPC分类号： G01B11/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/68 ,  G01B9/02

CPC分类号： G03F7/70775 ,  G03F9/70

摘要： A displacement detecting system includes a scale provided on a surface of a movable object and having a diffraction grating formed along a predetermined direction, a head unit disposed above the surface of the movable object and having a plurality of detection heads, for detecting displacement of the scale in the predetermined direction, the detection heads being disposed along a direction different from the predetermined direction, and a selecting device for selecting at least one detection head out of the detection heads, for detection of a displacement of the scale in the predetermined direction.

摘要翻译： 位移检测系统包括设置在可移动物体的表面上并具有沿着预定方向形成的衍射光栅的标尺，头单元，其设置在可移动物体的表面上方并具有多个检测头，用于检测位移 检测头沿着与预定方向不同的方向设置，以及选择装置，用于从检测头中选择至少一个检测头，以检测标尺在预定方向上的位移。

公开(公告)号：US5486919A

公开(公告)日：1996-01-23

申请号：US76951

申请日：1993-06-15

申请人： Toshihiko Tsuji ,  Seiji Takeuchi ,  Kyoichi Miyazaki ,  Minoru Yoshii ,  Noriyuki Nose ,  Tetsuzo Mori

发明人： Toshihiko Tsuji ,  Seiji Takeuchi ,  Kyoichi Miyazaki ,  Minoru Yoshii ,  Noriyuki Nose ,  Tetsuzo Mori

IPC分类号： G01J9/02 ,  G01J9/04 ,  G01N21/88 ,  G01N21/94 ,  G03F7/20 ,  G01B9/02

CPC分类号： G03F7/70616 ,  G01N21/88 ,  G01N21/94 ,  G03F7/7065 ,  G03F7/70916 ,  G01J2009/0261 ,  G01J9/04 ,  G01N2021/4792 ,  G01N21/8806

摘要： Disclosed is an inspection method and apparatus: wherein (i) first light having a first state of polarization and a first wavelength, and (ii) second light having a second state of polarization, different from the first state of polarization, and a second wavelength, different from the first wavelength are produced; at least the first light is projected to a position of inspection; and heterodyne interference light produced on the basis of the second light and light scattered at the inspection position and having its state of polarization changed, by the scattering, from the first state of polarization, is detected.

摘要翻译： 公开了一种检查方法和装置：其中（i）具有第一偏振状态和第一波长的第一光，以及（ii）具有与第一偏振态不同的第二极化状态的第二光，以及第二波长 ，与第一波长不同; 至少第一个光被投射到检查的位置; 并且检测基于第二光产生的外差干涉光和在检查位置上散射并且具有从第一极化状态通过散射改变其偏振状态的光。

公开(公告)号：US07508493B2

公开(公告)日：2009-03-24

申请号：US11675204

申请日：2007-02-15

申请人： Seiji Takeuchi ,  Kenji Yamazoe ,  Yumiko Ohsaki ,  Minoru Yoshii

发明人： Seiji Takeuchi ,  Kenji Yamazoe ,  Yumiko Ohsaki ,  Minoru Yoshii

IPC分类号： G03B27/72

CPC分类号： G03F7/70108 ,  G03F7/70566

摘要： An exposure apparatus includes an illumination optical system configured to illuminate a reticle, a projection optical system configured to project a pattern of the reticle onto a substrate, a polarization adjuster configured to independently adjust each polarization state of plural areas in an effective light source distribution used to illuminate the reticle, a polarization measurement unit configured to measure a polarization state of light that has passed the polarization adjuster, and a controller configured to independently control each polarization state of the plural areas via the polarization adjuster based on a measurement result of the polarization measurement unit.

摘要翻译： 曝光装置包括：照明光学系统，其被配置为照射光罩;投影光学系统，被配置为将掩模版的图案投影到基板上;偏振调节器，被配置为独立地调节所使用的有效光源分布中的多个区域的各个偏振状态 照明所述掩模版;偏振测量单元，被配置为测量已经通过所述偏振调节器的光的偏振状态;以及控制器，被配置为基于所述偏振光的测量结果，经由所述偏振调节器独立地控制所述多个区域的偏振状态 测量单位。

公开(公告)号：US5767962A

公开(公告)日：1998-06-16

申请号：US755352

申请日：1996-11-25

申请人： Masayuki Suzuki ,  Noriyuki Nose ,  Minoru Yoshii ,  Kyoichi Miyazaki ,  Toshihiko Tsuji ,  Seiji Takeuchi

发明人： Masayuki Suzuki ,  Noriyuki Nose ,  Minoru Yoshii ,  Kyoichi Miyazaki ,  Toshihiko Tsuji ,  Seiji Takeuchi

IPC分类号： G01N21/88 ,  G01B11/30 ,  G01N21/94 ,  G01N21/956 ,  G03F1/84 ,  H01L21/66 ,  G01N21/00

CPC分类号： G01N21/94

摘要： An inspection system includes a light source, a scanning device for scanning a surface to be inspected, with light from the light source, wherein the scanning device includes an optical member disposed with inclination with respect to a primary scan direction, the optical member being adapted to provide a convergent light being converged to form a spot at a distance changeable with the position of a scan, and a light receiving device for receiving scattered light from the surface.

摘要翻译： 检查系统包括光源，用于扫描来自光源的光的扫描装置，其中所述扫描装置包括相对于主扫描方向倾斜设置的光学构件，所述光学构件适于 以提供会聚的光会聚在一起形成与扫描位置可变的距离的光点，以及用于接收来自表面的散射光的光接收装置。