发明授权
- 专利标题： Environmental system including a transport region for an immersion lithography apparatus
- 专利标题（中）： 环境系统包括浸没式光刻设备的传送区域
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申请号： US11705001申请日： 2007-02-12
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公开(公告)号： US07345742B2公开(公告)日： 2008-03-18
- 发明人: W. Thomas Novak , Andrew J. Hazelton , Douglas C. Watson
- 申请人： W. Thomas Novak , Andrew J. Hazelton , Douglas C. Watson
- 申请人地址： JP Tokyo
- 专利权人： Nikon Corporation
- 当前专利权人： Nikon Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Oliff & Berridge, PLC
- 主分类号： G03B27/58
- IPC分类号： G03B27/58 ; G03B27/32
摘要：
A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid removal system having a conduit having an open end adjacent a volume in which liquid will be present, a porous member between the end of the conduit and the volume, and a suction device arranged to create a pressure differential across the porous member.
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