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公开(公告)号：US20120019792A1
公开(公告)日：2012-01-26
申请号：US13200982
申请日：2011-10-06
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A liquid immersion lithography apparatus includes a stage on which a wafer is held. A projection system projects a pattern image to an exposure region through an immersion liquid to expose the wafer on the stage. A plurality of supply openings are arranged to surround the exposure region, via which the liquid is supplied from above the exposure region. A plurality of recovery openings are arranged to surround the exposure region, via which the liquid is collected from above the exposure region. A part of the supply openings are selected so as to supply the liquid ahead of the exposure region in a direction in which the stage moves.
摘要翻译： 液浸光刻设备包括其上保持晶片的台。 投影系统通过浸没液将图案图像投影到曝光区域，以露出台上的晶片。 多个供应开口布置成围绕曝光区域，液体从曝光区域的上方供应。 多个恢复开口被布置成围绕曝光区域，通过该曝光区域从曝光区域上方收集液体。 选择供给开口的一部分，以便在台架移动的方向上将曝光区域前方的液体供给。
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2.发明授权Environmental system including a transport region for an immersion lithography apparatus 有权环境系统包括浸没式光刻设备的传送区域公开(公告)号：US07929111B2
公开(公告)日：2011-04-19
申请号：US11819447
申请日：2007-06-27
IPC分类号： G03B27/42
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/7095
摘要： A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a mesh member through which a liquid is collected from a surface of an object opposite to the liquid collection member.
摘要翻译： 布置成使用投影系统从图案形成装置将图案投影到基板上的光刻投影装置具有布置成将液体供应到投影系统和基板之间的空间的液体供应系统。 该装置还包括液体收集系统，该液体收集系统包括具有网状构件的液体收集构件，通过该网状构件从与液体收集构件相对的物体的表面收集液体。
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公开(公告)号：US07869000B2
公开(公告)日：2011-01-11
申请号：US11048405
申请日：2005-01-31
申请人： Yoichi Arai , Andrew J. Hazelton , Michael Binnard , W. Thomas Novak , Douglas C. Watson , Kirk Lok
发明人： Yoichi Arai , Andrew J. Hazelton , Michael Binnard , W. Thomas Novak , Douglas C. Watson , Kirk Lok
CPC分类号： G03F7/70716
摘要： A stage assembly (220) that moves a work piece (200) along a first axis, along a second axis and along a third axis includes a first stage (238), a first mover assembly (242) that moves the first stage (238) along the first axis, a second stage (240) that retains the work piece (200), a second mover assembly (244), and a non-contact bearing (257). The second mover assembly (244) moves the second stage (240) relative to the first stage (238) along the first axis, along the second axis, and along the third axis. The non-contact bearing (257) supports the mass of the second stage (240). Further, the non-contact bearing (257) allows the second stage (240) to move relative to the first stage (238) along the first axis and along the second axis. The second mover assembly (244) can move the second stage (240) with at least four degrees of movement.
摘要翻译： 沿着第二轴线沿着第三轴线沿着第一轴线移动工件（200）的台架组件（220）包括第一阶段（238），第一移动器组件（242），其使第一阶段（238）移动 ），保持所述工件（200）的第二级（240），第二移动器组件（244）和非接触式轴承（257）。 第二移动器组件（244）沿着第一轴线沿着第二轴线和第三轴线相对于第一阶段（238）移动第二阶段（240）。 非接触轴承（257）支撑第二级（240）的质量。 此外，非接触式轴承（257）允许第二级（240）相对于第一级（238）沿着第一轴线并沿着第二轴线移动。 第二移动器组件（244）可以以至少四个移动程度移动第二平台（240）。
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4.发明授权Adaptive optic with discrete actuators for continuous deformation of a deformable mirror system 失效具有离散致动器的自适应光学器件用于可变形反射镜系统的连续变形公开(公告)号：US06880942B2
公开(公告)日：2005-04-19
申请号：US10460644
申请日：2003-06-13
CPC分类号： G03F7/70266 , G02B26/0825
摘要： Adaptive optical elements for use in high precision lithography exposure are provided with an array of discrete actuators to provide highly stable and repeatable correction of the shape of an optical element to an accuracy of a small fraction of a very short wavelength of light in the EUV range of 1 to 50 nanometers, responsive to a metrology source and sensor arrangement. The actuators are matched to the deformation characteristics of the adaptive optical elements. Preferably, the actuators provide both positive and negative force for outward and/or inward deflection continuously over the surface of the mirror. The surface of the optical element may thus be accurately, controllably and repeatably deformed to within an allowable deformation limit to optimize optical performance of an optical system for high precision lithography exposure.
摘要翻译： 用于高精度光刻曝光的自适应光学元件设置有离散致动器的阵列，以提供高度稳定且可重复的光学元件形状的校正，使其在EUV范围内的非常短波长的光的一小部分的精度 1至50纳米，响应于测量源和传感器布置。 致动器与自适应光学元件的变形特性相匹配。 优选地，致动器在反射镜的表面上连续地向外和/或向内偏转提供正的和负的力。 因此，光学元件的表面因此可以精确地，可控地和可重复地变形到允许的变形极限内，以优化用于高精度光刻曝光的光学系统的光学性能。
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公开(公告)号：US20110031416A1
公开(公告)日：2011-02-10
申请号：US12923948
申请日：2010-10-15
CPC分类号： G03F7/70341
摘要： A photolithography tool for use in manufacturing semiconductor devices, includes a wafer stage, a lens, and a liquid dispensing assembly by which liquid is introduced between a surface of a semiconductor wafer disposed on the wafer stage and the lens, along a direction away from the semiconductor wafer at its edge.
摘要翻译： 用于制造半导体器件的光刻工具包括晶片台，透镜和液体分配组件，通过该液体分配组件将液体沿着远离所述晶片台的方向引导到设置在晶片台上的半导体晶片的表面和透镜之间 半导体晶片在其边缘。
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公开(公告)号：US07443482B2
公开(公告)日：2008-10-28
申请号：US11236759
申请日：2005-09-28
CPC分类号： G03F7/70341
摘要： A liquid jet and recovery system for an immersion lithography apparatus has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected onto a workpiece such as a wafer. These nozzles are each adapted to serve selectively either as a source nozzle for supplying a fluid into the exposure region or as a recovery nozzle for recovering the fluid from the exposure region. A fluid controlling device functions to cause nozzles on selected one or more sides of the exposure region to serve as source nozzles and to cause nozzles on selected one or more of the remaining sides to serve as recovery nozzles such that a desired flow pattern can be established for the convenience of immersion lithography.
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公开(公告)号：US07932989B2
公开(公告)日：2011-04-26
申请号：US11808850
申请日：2007-06-13
CPC分类号： G03F7/70341
摘要： A liquid jet and recovery system for an immersion lithography apparatus has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected onto a workpiece such as a wafer. These nozzles are each adapted to serve selectively either as a source nozzle for supplying a fluid into the exposure region or as a recovery nozzle for recovering the fluid from the exposure region. A fluid controlling device functions to cause nozzles on selected one or more sides of the exposure region to serve as source nozzles and to cause nozzles on selected one or more of the remaining sides to serve as recovery nozzles such that a desired flow pattern can be established for the convenience of immersion lithography.
摘要翻译： 用于浸没式光刻设备的液体喷射和回收系统具有布置成使其开口位于曝光区域附近的喷嘴阵列，通过该曝光区域将图像图案投影到诸如晶片的工件上。 这些喷嘴各自适于选择性地用作用于将流体供应到曝光区域中的源喷嘴或用作从曝光区域回收流体的回收喷嘴。 流体控制装置用于使得在曝光区域的所选一个或多个侧面上的喷嘴用作源喷嘴并且使所选择的一个或多个剩余侧面上的喷嘴用作回收喷嘴，使得可以建立期望的流动模式 为了方便浸没光刻。
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公开(公告)号：US07821615B2
公开(公告)日：2010-10-26
申请号：US11808850
申请日：2007-06-13
摘要： A liquid jet and recovery system for an immersion lithography apparatus has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected onto a workpiece such as a wafer. These nozzles are each adapted to serve selectively either as a source nozzle for supplying a fluid into the exposure region or as a recovery nozzle for recovering the fluid from the exposure region. A fluid controlling device functions to cause nozzles on selected one or more sides of the exposure region to serve as source nozzles and to cause nozzles on selected one or more of the remaining sides to serve as recovery nozzles such that a desired flow pattern can be established for the convenience of immersion lithography.
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9.发明授权Environmental system including a transport region for an immersion lithography apparatus 有权环境系统包括浸没式光刻设备的传送区域公开(公告)号：US08830443B2
公开(公告)日：2014-09-09
申请号：US13067464
申请日：2011-06-02
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/7095
摘要： A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a permeable member through which a liquid is collected from a surface of an object opposite to the liquid collection member, wherein the permeable member has a plurality of passages that generate a capillary force.
摘要翻译： 布置成使用投影系统从图案形成装置将图案投影到基板上的光刻投影装置具有布置成将液体供应到投影系统和基板之间的空间的液体供应系统。 该装置还包括液体收集系统，其包括具有可渗透构件的液体收集构件，通过该液体收集构件从与液体收集构件相对的物体的表面收集液体，其中可渗透构件具有多个通道，其产生毛细管 力。
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10.发明授权Environmental system including a transport region for an immersion lithography apparatus 有权环境系统包括浸没式光刻设备的传送区域公开(公告)号：US07929110B2
公开(公告)日：2011-04-19
申请号：US11819446
申请日：2007-06-27
IPC分类号： G03B27/42
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/7095
摘要： A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system having a liquid collection member having a liquid-permeable member through which a liquid is collected from a surface of an object opposite to the liquid collection member.
摘要翻译： 布置成使用投影系统从图案形成装置将图案投影到基板上的光刻投影装置具有布置成将液体供应到投影系统和基板之间的空间的液体供应系统。 该装置还包括具有液体收集构件的液体收集系统，该液体收集构件具有液体可渗透构件，通过该液体收集构件从与液体收集构件相对的物体的表面收集液体。
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