发明授权
- 专利标题: Process for treating fluorine compound-containing gas
- 专利标题(中): 含氟化合物气体处理方法
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申请号: US10679297申请日: 2003-10-07
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公开(公告)号: US07347980B2公开(公告)日: 2008-03-25
- 发明人: Shuichi Kanno , Toshiaki Arato , Shinzo Ikeda , Ken Yasuda , Hisao Yamashita , Shigeru Azuhata , Shin Tamata , Kazuyoshi Irie
- 申请人: Shuichi Kanno , Toshiaki Arato , Shinzo Ikeda , Ken Yasuda , Hisao Yamashita , Shigeru Azuhata , Shin Tamata , Kazuyoshi Irie
- 申请人地址: JP Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Crowell & Moring LLP
- 优先权: JP9-004349 19970114; JP9-163717 19970620
- 主分类号: A62D3/00
- IPC分类号: A62D3/00 ; B01D53/86
摘要:
A gas stream containing at least one fluorine compound selected from the group consisting of compounds of carbon and fluorine, compounds of carbon, hydrogen and fluorine, compounds of sulfur and fluorine, compounds of nitrogen and fluorine and compounds of carbon, hydrogen, oxygen and fluorine is contacted with a catalyst comprising at least one of alumina, titania, zirconia and silica, preferably a catalyst comprising alumina and at least one of nickel oxide, zinc oxide and titania in the presence of steam, thereby hydrolyzing the fluorine compound at a relatively low temperature, e.g. 200°–800° C., to convert the fluorine of the fluorine compound to hydrogen fluoride.
公开/授权文献
- US20040047786A1 Process for treating fluorine compound-containing gas 公开/授权日:2004-03-11