公开(公告)号：US08231851B2

公开(公告)日：2012-07-31

申请号：US10244010

申请日：2002-09-16

申请人： Kazuyoshi Irie ,  Toshihiro Mori ,  Hisao Yokoyama ,  Takayuki Tomiyama ,  Toshihide Takano ,  Shin Tamata ,  Shuichi Kanno

发明人： Kazuyoshi Irie ,  Toshihiro Mori ,  Hisao Yokoyama ,  Takayuki Tomiyama ,  Toshihide Takano ,  Shin Tamata ,  Shuichi Kanno

IPC分类号： B01D53/34 ,  B01D53/68 ,  B01D53/86 ,  B01D53/70

CPC分类号： B01D53/8659 ,  B01D53/8662 ,  Y02C20/30

摘要： An exhaust gas containing a perfluoride compound (PFC) and SiF4 is conducted into a silicon remover and brought into contact with water. A reaction water supplied from a water supplying piping and air supplied from an air supplying piping are mixed with the exhaust gas exhausted from the silicon remover. The exhaust gas containing water, air, and CF4 is heated at 700° C. by a heater. The exhaust gas containing PFC is conducted to a catalyst layer filled with an alumina group catalyst. The PFC is decomposed to HF and CO2 by the catalyst. The exhaust gas containing HF and CO2 at a high temperature exhausted from the catalyst layer is cooled in a cooling apparatus. Subsequently, the exhaust gas is conducted to an acidic gas removing apparatus to remove HF. In this way, the silicon component is removed from the exhaust gas before introducing the exhaust gas into the catalyst layer. Therefore, the surface of the catalyst can be utilized effectively, and the decomposition reaction of the perfluoride compound can be improved.

摘要翻译： 将含有全氟化合物（PFC）和SiF 4的废气导入硅去除剂中并与水接触。 从供水管道供应的反应水和从供气管道供应的空气与从硅去除器排出的废气混合。 含有水，空气和CF4的废气通过加热器在700℃加热。 含有PFC的废气被传导到填充有氧化铝基催化剂的催化剂层。 PFC通过催化剂分解成HF和CO2。 在从催化剂层排出的高温下含有HF和CO 2的废气在冷却装置中被冷却。 随后，将废气导入酸性气体去除装置中去除HF。 以这种方式，在将废气引入催化剂层之前，从排气中除去硅组分。 因此，可有效利用催化剂的表面，可以提高全氟化合物的分解反应。

公开(公告)号：US07658890B2

公开(公告)日：2010-02-09

申请号：US11289654

申请日：2005-11-30

申请人： Ri Kokun ,  Shin Tamata

发明人： Ri Kokun ,  Shin Tamata

IPC分类号： B01D50/00 ,  B01D53/34 ,  F01N3/00

CPC分类号： B01D53/869 ,  B01D53/8662 ,  Y02C20/30

摘要： A plurality of etchers such as poly-etchers 3 or the like are installed within a clean room 2. A duct 7 that is connected to all the etchers is connected to a PFC decomposition device 9, which is installed outside of the clean room 2. An exhaust gas which contains PFC as drained out of all the etchers within the clean room 2 is supplied by the duct 7 to the inner space of PFC decomposition device 9. After having heated up within the PFC decomposition device 9, the PFC is decomposed by the action of a catalyst which is filled within the PFC decomposition device 9. It is no longer required to provide a space for installation of the PFC decomposition device 9 in the clean room 2 with the semiconductor fabrication apparatus or the liquid crystal manufacturing apparatus installed therein, thus enabling size reduction or “downsizing” of the clean room. It is possible to reduce the size of a clean room in which a semiconductor fabricating apparatus or a liquid crystal manufacturing apparatus is installed.

摘要翻译： 多个蚀刻器如聚蚀刻器3等安装在洁净室2内。连接到所有蚀刻器的管道7连接到安装在洁净室2外部的PFC分解装置9。 在清洁室2内的所有蚀刻器中排出PFC的废气由管道7供应到PFC分解装置9的内部空间。在PFC分解装置9中被加热之后，PFC被PFC分解装置9分解 填充在PFC分解装置9内的催化剂的作用。不再需要在半导体制造装置或液晶制造装置中安装PFC分解装置9以安装在洁净室2中的空间 ，因此能够实现洁净室的尺寸减小或“小型化”。 可以减小安装半导体制造装置或液晶制造装置的洁净室的尺寸。

公开(公告)号：US20090142244A1

公开(公告)日：2009-06-04

申请号：US12367048

申请日：2009-02-06

申请人： Shuichi Kanno ,  Shin Tamata ,  Shinichi Ichikawa ,  Terufumi Kawasaki ,  Hisao Yamashita

发明人： Shuichi Kanno ,  Shin Tamata ,  Shinichi Ichikawa ,  Terufumi Kawasaki ,  Hisao Yamashita

IPC分类号： C01B7/20

CPC分类号： B01D53/8662 ,  Y02C20/30

摘要： An object of the present invention is to improve the decomposition at low temperatures of perfluorocompounds containing only fluorine as a halogen, such as CF4, C2F6 and the like. In the present invention, a perfluorocompound containing only fluorine as a halogen is brought into contact with a catalyst comprising Al, Ni and W as catalytically active ingredients and comprising a mixed oxide or complex oxide of Ni and Al and a mixed oxide or complex oxide of W and Ni, in the presence of steam or a combination of steam and air at a temperature of 500 to 800° C. to convert the fluorine in the perfluorocompound to hydrogen fluoride. Employment of the catalyst of the present invention improves the decomposition at low temperatures and hence makes it possible to decompose the perfluoro-compound at a high percentage of decomposition at a lower temperature.

摘要翻译： 本发明的一个目的是改进在低温下仅含氟作为卤素的氟化物如CF4，C2F6等的分解。 在本发明中，将仅含氟作为卤素的全氟化合物与包含Al，Ni和W的催化剂作为催化活性成分接触，并且包含Ni和Al的混合氧化物或复合氧化物以及混合氧化物或复合氧化物 W和Ni，在蒸汽或蒸汽与空气的组合的存在下，在500至800℃的温度下，将全氟化合物中的氟转化为氟化氢。 本发明的催化剂的使用改善了低温下的分解，因此可以在较低温度下以高百分比的分解来分解全氟化合物。

公开(公告)号：US07128882B2

公开(公告)日：2006-10-31

申请号：US10090817

申请日：2002-03-06

申请人： Shin Tamata ,  Ri Koukun ,  Kazuyoshi Irie ,  Yoshiki Shibano ,  Shuichi Kanno

发明人： Shin Tamata ,  Ri Koukun ,  Kazuyoshi Irie ,  Yoshiki Shibano ,  Shuichi Kanno

IPC分类号： B01D50/00 ,  B01D47/00 ,  B01D53/14

CPC分类号： B01D53/68 ,  B01D53/70 ,  B01D53/8659 ,  B01D53/8662 ,  Y02C20/30 ,  Y02P70/605

摘要： In a PFC decomposing apparatus according to the present invention, PFC contained in a discharged gas is decomposed in catalyst cartridge 3 packed with a catalyst containing 80% Al2O3 and 20% NiO. The discharged gas containing acid gases as a decomposition gas is cooled in cooling chamber 6 and led to discharged gas washing column 13, where the acid gases are removed. Mists of acid gases (SO3 mists or NOx mists) entrained in the discharged gas are separed in cyclone 16. Compressed air at about 0.1 Mpa is fed to ejector 24 through air feed pipe 56. The interior of ejector 24 is brought into a negative pressure state by the compressed air to such the discharged gas from cyclone 16 and ejector. Ejector 24 can reduce a frequency of maintenance inspection, as compared with a blower.

摘要翻译： 在根据本发明的PFC分解装置中，排出气体中所含的PFC在催化剂筒3中分解，催化剂筒3装有含有80％Al 2 O 3 3和20的催化剂 ％NiO。 将含有作为分解气体的酸性气体的排出气体在冷却室6中冷却，并导入排出气体洗涤塔13，排出气体被除去。 携带在排放气体中的酸性气体（SO 3 3雾或NO x雾）的雾气在旋风分离器16中分离。 约0.1Mpa的压缩空气通过供气管56供给喷射器24。 喷射器24的内部通过压缩空气进入负压状态，使得来自旋风分离器16和喷射器的排放气体。 与鼓风机相比，喷射器24可以减少维护检查的频率。

公开(公告)号：US07033550B2

公开(公告)日：2006-04-25

申请号：US10684375

申请日：2003-10-15

申请人： Shuichi Kanno ,  Shin Tamata ,  Kazuyoshi Irie ,  Kenji Yamamoto ,  Masayuki Taniguchi ,  Osamu Ito ,  Hironobu Kobayashi

发明人： Shuichi Kanno ,  Shin Tamata ,  Kazuyoshi Irie ,  Kenji Yamamoto ,  Masayuki Taniguchi ,  Osamu Ito ,  Hironobu Kobayashi

IPC分类号： B01D50/34 ,  A62D3/00

CPC分类号： B01D53/885 ,  Y02C20/30

摘要： The catalytic exhaust gas decomposition apparatus spirals an exhaust gas containing therein a substance to be decomposed and a reactant gas, rectifies the spiral flow, and lets the substance to be decomposed contained in the exhaust gas react with the reactant gas after the spiral flow has been rectified. This arrangement rectifies the spiral flow of the exhaust gas and the reactant gas with a plate-like baffle wall having therein a through hole at a portion near the center thereof. The spiral flow is allowed to pass through the through hole so as to be centralized temporarily. The spiral flow then passes through an enlarged section of a flow path downstream of the through hole before being introduced into the catalyst bed.

摘要翻译： 催化废气分解装置使含有分解物质的废气与反应气体螺旋化，对螺旋流进行整流，使在废气中分解的物质与螺旋流动后的反应气体反应 纠正 这种布置使排气和反应气体的螺旋流量与其中具有在其中心附近的部分处具有通孔的板状挡板整流。 允许螺旋流通过通孔，以便暂时集中。 然后，在引入催化剂床之前，螺旋流通过通孔下游的流路的扩大部分。

公开(公告)号：US20060062705A1

公开(公告)日：2006-03-23

申请号：US11270550

申请日：2005-11-10

申请人： Shuichi Kanno ,  Shin Tamata ,  Kazuyoshi Irie ,  Kenji Yamamoto ,  Masayuki Taniguchi ,  Osamu Ito ,  Hironobu Kobayashi

发明人： Shuichi Kanno ,  Shin Tamata ,  Kazuyoshi Irie ,  Kenji Yamamoto ,  Masayuki Taniguchi ,  Osamu Ito ,  Hironobu Kobayashi

IPC分类号： B01D50/00

CPC分类号： B01D53/885 ,  Y02C20/30

摘要： In a catalytic exhaust gas decomposition apparatus according to the preferred embodiment of the present invention, it is possible to suppress variations in velocity distribution of the gases introduced to the catalyst bed. The catalytic exhaust gas decomposition apparatus spirals an exhaust gas containing therein a substance to be decomposed and a reactant gas, rectifies the spiral flow, and lets the substance to be decomposed contained in the exhaust gas react with the reactant gas after the spiral flow has been rectified. This arrangement uses, as a means for rectifying the spiral flow of the exhaust gas and the reactant gas, a plate-like baffle wall having therein a through hole at a portion near the center thereof. The spiral flow is allowed to pass through the through hole so as to be centralized temporarily. The spiral flow then passes through an enlarged section of a flow path downstream of the through hole before being introduced into the catalyst bed. The arrangement helps minimize variations in gas velocity of the exhaust gas flowing into the catalyst bed, thereby allowing a desired decomposition rate to be obtained substantially consistently.

摘要翻译： 在根据本发明优选实施方案的催化废气分解装置中，可以抑制引入催化剂床的气体的速度分布的变化。 催化废气分解装置使含有分解物质的废气与反应气体螺旋化，对螺旋流进行整流，使在废气中分解的物质与螺旋流动后的反应气体反应 纠正 作为用于对排气和反应气体的螺旋流进行整流的装置，使用板状挡板，其中央部附近具有通孔。 允许螺旋流通过通孔，以便暂时集中。 然后，在引入催化剂床之前，螺旋流通过通孔下游的流路的扩大部分。 这种布置有助于最小化流入催化剂床的废气的气体速度变化，从而可以基本上一致地获得所需的分解速率。

公开(公告)号：US06855305B2

公开(公告)日：2005-02-15

申请号：US10677961

申请日：2003-10-03

申请人： Shuichi Kanno ,  Toshiaki Arato ,  Shinzo Ikeda ,  Ken Yasuda ,  Hisao Yamashita ,  Shigeru Azuhata ,  Shin Tamata ,  Kazuyoshi Irie

发明人： Shuichi Kanno ,  Toshiaki Arato ,  Shinzo Ikeda ,  Ken Yasuda ,  Hisao Yamashita ,  Shigeru Azuhata ,  Shin Tamata ,  Kazuyoshi Irie

IPC分类号： A62D3/00 ,  A62D3/20 ,  A62D101/22 ,  A62D101/49 ,  B01D53/86 ,  B01D53/48 ,  B01D53/68

CPC分类号： A62D3/20 ,  A62D2101/22 ,  A62D2101/49 ,  B01D53/8659 ,  B01D53/8662 ,  B01D53/8671 ,  B01D2255/2092 ,  B01D2257/204 ,  B01D2258/0216 ,  C01B7/191 ,  Y02C20/30

摘要： A gas stream containing at least one fluorine compound selected from the group consisting of compounds of carbon and fluorine, compounds of carbon, hydrogen and fluorine, compounds of sulfur and fluorine, compounds of nitrogen and fluorine and compounds of carbon, hydrogen, oxygen and fluorine is contacted with a catalyst comprising at least one of alumina, titania, zirconia and silica, preferably a catalyst comprising alumina and at least one of nickel oxide, zinc oxide and titania in the presence of steam, thereby hydrolyzing the fluorine compound at a relatively low temperature, e.g. 200°-800° C., to convert the fluorine of the fluorine compound to hydrogen fluoride.

公开(公告)号：US07666365B2

公开(公告)日：2010-02-23

申请号：US11108768

申请日：2005-04-19

申请人： Ri Kokun ,  Shin Tamata

发明人： Ri Kokun ,  Shin Tamata

IPC分类号： F01N3/10 ,  B01D50/00 ,  B01D53/34 ,  F01N3/00

CPC分类号： B01D53/869 ,  B01D53/8662 ,  Y02C20/30

摘要： A plurality of etchers such as poly-etchers 3 or the like are installed within a clean room 2. A duct 7 that is connected to all the etchers is connected to a PFC decomposition device 9, which is installed outside of the clean room 2. An exhaust gas which contains PFC as drained out of all the etchers within the clean room 2 is supplied by the duct 7 to the inner space of PFC decomposition device 9. After having heated up within the PFC decomposition device 9, the PFC is decomposed by the action of a catalyst which is filled within the PFC decomposition device 9. It is no longer required to provide a space for installation of the PFC decomposition device 9 in the clean room 2 with the semiconductor fabrication apparatus or the liquid crystal manufacturing apparatus installed therein, thus enabling size reduction or “downsizing” of the clean room. It is possible to reduce the size of a clean room in which a semiconductor fabricating apparatus or a liquid crystal manufacturing apparatus is installed.

摘要翻译： 多个蚀刻器如聚蚀刻器3等安装在洁净室2内。连接到所有蚀刻器的管道7连接到安装在洁净室2外部的PFC分解装置9。 在清洁室2内的所有蚀刻器中排出PFC的废气由管道7供应到PFC分解装置9的内部空间。在PFC分解装置9中被加热之后，PFC被PFC分解装置9分解 填充在PFC分解装置9内的催化剂的作用。不再需要在半导体制造装置或液晶制造装置中安装PFC分解装置9以安装在洁净室2中的空间 ，因此能够实现洁净室的尺寸减小或“小型化”。 可以减小安装半导体制造装置或液晶制造装置的洁净室的尺寸。

公开(公告)号：US07641867B2

公开(公告)日：2010-01-05

申请号：US11473072

申请日：2006-06-23

申请人： Kazuyoshi Irie ,  Toshihiro Mori ,  Hisao Yokoyama ,  Takayuki Tomiyama ,  Toshihide Takano ,  Shin Tamata ,  Shuichi Kanno

发明人： Kazuyoshi Irie ,  Toshihiro Mori ,  Hisao Yokoyama ,  Takayuki Tomiyama ,  Toshihide Takano ,  Shin Tamata ,  Shuichi Kanno

IPC分类号： B01D53/34 ,  B01D50/00

CPC分类号： B01J4/002 ,  B01D53/8659 ,  B01D53/8662 ,  B01J8/0221 ,  B01J8/025 ,  B01J8/0278 ,  B01J8/0285 ,  B01J19/26 ,  B01J2208/00061 ,  B01J2208/00203 ,  B01J2208/00362 ,  B01J2208/00407 ,  B01J2208/00415 ,  B01J2208/00495 ,  B01J2208/0053 ,  B01J2208/00814 ,  B01J2208/0084 ,  B01J2208/00884 ,  B01J2219/00006 ,  Y02C20/30

摘要： An exhaust gas containing a perfluoride component (PFC) and SiIF4 is conducted into a silicon remover and brought into contact with water. A reaction water supplied from a water supplying piping and air supplied from an air supplying piping are mixed with the exhaust gas exhausted from the silicon remover. The exhaust gas containing water, air, and CF4 is heated at 700° C. by a heater. The exhaust gas containing PFC is conducted to a catalyst layer filled with an alumina group catalyst. The PFC is decomposed to HF and CO2 at a high temperature exhausted from the catalyst layer is cooled in a cooling apparatus. Subsequently, the exhaust gas is conducted to an acidic gas removing apparatus to remove HF. In this way, the silicon component is removed from the exhaust gas before introducing the exhaust gas into the catalyst layer. Therefore, the surface of the catalyst can be utilized effectively, and the decomposition reaction of the perfluoride compound can be improved.

摘要翻译： 将含有全氟化物成分（PFC）和SiIF 4的废气导入硅去除剂中并与水接触。 从供水管道供应的反应水和从供气管道供应的空气与从硅去除器排出的废气混合。 含有水，空气和CF4的废气通过加热器在700℃加热。 含有PFC的废气被传导到填充有氧化铝基催化剂的催化剂层。 将PFC分解成HF，并在从催化剂层排出的高温下将CO 2在冷却装置中冷却。 随后，将废气导入酸性气体去除装置中去除HF。 以这种方式，在将废气引入催化剂层之前，从排气中除去硅组分。 因此，可有效利用催化剂的表面，可以提高全氟化合物的分解反应。

公开(公告)号：US07294315B1

公开(公告)日：2007-11-13

申请号：US09936426

申请日：1999-06-09

申请人： Shuichi Kanno ,  Akio Honji ,  Hisao Yamashita ,  Shigeru Azuhata ,  Shin Tamata ,  Kazuyoshi Irie

发明人： Shuichi Kanno ,  Akio Honji ,  Hisao Yamashita ,  Shigeru Azuhata ,  Shin Tamata ,  Kazuyoshi Irie

IPC分类号： B01D53/34

CPC分类号： B01J23/34 ,  B01D53/8659 ,  B01J23/38 ,  B01J23/63 ,  B01J23/70 ,  Y02C20/10 ,  Y02C20/30

摘要： Fluorine compounds such as C2F6, CF4, CHF3, SF6 and NF3, are made in contact with a fluorine compound decomposition catalyst and a catalyst the decomposition oft least one of CO, SO2F2 and N2O in the presence of water or in the presence of water and oxygen. The catalyst the decomposition oft least one of CO, SO2F2 and N2O preferably contains at least one selected from Pd, Pt, Cu, Mn, Fe, Co, Rh, Ir and Au in the form of a metal or an oxide. According to the invention, the fluorine compound can be converted to HF, which is liable to be absorbed by water or an alkaline aqueous solution, and a substance, such as CO, SO2F2 and N2O, formed by decomposition of the fluorine compound can also be decomposed.

摘要翻译： 氟化合物如C 2 F 6，CF 4，CH 3，SF 6， SUB＆gt;和NF 3 3与氟化合物分解催化剂和催化剂接触，分解为CO，SO 2/2 / 在水的存在下或在水和氧的存在下，将其与N 2 O 2 O反应。 CO，SO 2 H 2 N 2和N 2 O 2中的至少一种的分解催化剂优选含有选自Pd，Pt， Cu，Mn，Fe，Co，Rh，Ir和Au。 根据本发明，氟化合物可以转化成易于被水或碱性水溶液吸收的HF，以及CO，SO 2 F 2等物质 由氟化合物分解形成的N和N 2 O也可以分解。