发明授权
- 专利标题: Method and apparatus with varying gate oxide thickness
- 专利标题(中): 具有不同栅极氧化物厚度的方法和装置
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申请号: US11114455申请日: 2005-04-25
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公开(公告)号: US07361961B2公开(公告)日: 2008-04-22
- 发明人: Irfan Rahim , Yow-Juang Bill Liu , Jeffrey Watt
- 申请人: Irfan Rahim , Yow-Juang Bill Liu , Jeffrey Watt
- 申请人地址: US CA San Jose
- 专利权人: Altera Corporation
- 当前专利权人: Altera Corporation
- 当前专利权人地址: US CA San Jose
- 代理机构: Martine Penilla & Gencarella, LLP
- 主分类号: H01L29/76
- IPC分类号: H01L29/76 ; H01L29/94 ; H01L31/062 ; H01L31/113 ; H01L31/119
摘要:
An integrated circuit having an enhanced on-off swing for pass gate transistors is provided. The integrated circuit includes a core region that includes core transistors and pass gate transistors. The core transistors have a gate oxide associated with a first thickness, the pass transistors having a gate oxide associated with a thickness that is less than the first thickness. In one embodiment, the material used for the gate oxide of the pass gate transistors has a dielectric constant that is greater than four, while the material used for the gate oxide of the core transistors has a dielectric constant that is less than or equal to four. A method for manufacturing an integrated circuit is also provided.
公开/授权文献
- US20060237784A1 Method and apparatus with varying gate oxide thickness 公开/授权日:2006-10-26
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