发明授权
- 专利标题: Fabrication system and fabrication method
- 专利标题(中): 制造系统及制造方法
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申请号: US11320610申请日: 2005-12-30
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公开(公告)号: US07392106B2公开(公告)日: 2008-06-24
- 发明人: Natsuki Yokoyama , Yoshifumi Kawamoto , Eiichi Murakami , Fumihiko Uchida , Kenichi Mizuishi , Yoshio Kawamura
- 申请人: Natsuki Yokoyama , Yoshifumi Kawamoto , Eiichi Murakami , Fumihiko Uchida , Kenichi Mizuishi , Yoshio Kawamura
- 申请人地址: JP Tokyo
- 专利权人: Renesas Technology Corp.
- 当前专利权人: Renesas Technology Corp.
- 当前专利权人地址: JP Tokyo
- 代理机构: Mattingly, Stanger, Malur & Brundidge. PC
- 优先权: JP5-175114 19930715; JP5-215489 19930831
- 主分类号: G06F19/00
- IPC分类号: G06F19/00
摘要:
A fabricating method for a system that includes a plurality of processing apparatuses connected to each other by an inter-apparatus transporter and a computer storing managing information of processing and transporting of semiconductor wafers. The processing apparatuses have an interface for loading and unloading a plurality of the semiconductor wafers that are contained in a carrier. The semiconductor waters are processed in processing chambers of the processing apparatuses and the result of processing is monitored. In the processing, a first carrier containing the plurality of the semiconductor wafers having been processed in the first processing apparatus is transported toward the second processing apparatus by the inter-apparatus transporter prior to unloading of a second carrier containing semiconductor wafers processed in the second processing apparatus, according to the managing information.
公开/授权文献
- US20060111802A1 Fabrication system and fabrication method 公开/授权日:2006-05-25
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