发明授权
- 专利标题: Nitride semiconductor device
- 专利标题(中): 氮化物半导体器件
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申请号: US11410920申请日: 2006-04-26
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公开(公告)号: US07425732B2公开(公告)日: 2008-09-16
- 发明人: Tetsuzo Ueda , Satoshi Nakazawa , Daisuke Ueda , Toshiyuki Takizawa
- 申请人: Tetsuzo Ueda , Satoshi Nakazawa , Daisuke Ueda , Toshiyuki Takizawa
- 申请人地址: JP Osaka
- 专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人地址: JP Osaka
- 代理机构: McDermott Will & Emery LLP
- 优先权: JP2005-129301 20050427
- 主分类号: H01L33/00
- IPC分类号: H01L33/00
摘要:
A nitride semiconductor device includes an active layer including a first nitride semiconductor layer and a second nitride semiconductor layer which are periodically stacked, the second nitride semiconductor layer having a different composition from a composition of the first nitride semiconductor layer. An energy at a lower edge of a conduction band in the first nitride semiconductor layer is lower than an energy at a lower edge of a conduction band in the second nitride semiconductor layer, and an energy at an upper edge of a valence band in the first nitride semiconductor layer is lower than an energy at an upper edge of a valence band in the second nitride semiconductor layer.
公开/授权文献
- US20060244003A1 Nitride semiconductor device 公开/授权日:2006-11-02
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