发明授权
- 专利标题: Method and apparatus for improved baffle plate
- 专利标题(中): 挡板改良方法及装置
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申请号: US10705224申请日: 2003-11-12
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公开(公告)号: US07461614B2公开(公告)日: 2008-12-09
- 发明人: Steven T Fink , Eric J Strang , Arthur H Laflamme, Jr. , Jay Wallace , Sandra Hyland
- 申请人: Steven T Fink , Eric J Strang , Arthur H Laflamme, Jr. , Jay Wallace , Sandra Hyland
- 申请人地址: JP
- 专利权人: Tokyo Electron Limited
- 当前专利权人: Tokyo Electron Limited
- 当前专利权人地址: JP
- 主分类号: C23C4/10
- IPC分类号: C23C4/10 ; H01L21/205
摘要:
A baffle plate assembly, configured to be coupled to a substrate holder in a plasma processing system, comprises a baffle plate having one or more openings to permit the passage of gas there through, wherein the coupling of the baffle plate to the substrate holder facilitates auto-centering of the baffle plate in the plasma processing system. For example, a centering ring mounted in the substrate holder can comprise a centering feature configured to couple with a mating feature on the baffle plate. After initial assembly of the plasma processing system, the baffle plate can be replaced and centered within the plasma processing system without disassembly and re-assembly of the substrate holder.
公开/授权文献
- US20050098265A1 Method and apparatus for improved baffle plate 公开/授权日:2005-05-12