发明授权
- 专利标题: Method and apparatus for inspecting pattern defects
- 专利标题(中): 检查图案缺陷的方法和装置
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申请号: US11518195申请日: 2006-09-11
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公开(公告)号: US07489395B2公开(公告)日: 2009-02-10
- 发明人: Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe
- 申请人: Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation, Ltd.
- 当前专利权人: Hitachi High-Technologies Corporation, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Antonelli, Terry, Stout & Kraus, LLP.
- 优先权: JP2001-277681 20010913
- 主分类号: G01N21/00
- IPC分类号: G01N21/00
摘要:
A method and apparatus for inspecting pattern defects emitting a laser beam, adjusting a light-amount of the laser beam, converting the light-amount adjusted laser beam into a slit-like laser light flux, lowering coherency of the slit-like laser light flux, and irradiating a sample with the coherence reduced slit-like laser light flux. An image of reflection light from the sample is obtained, and a detector is provided which includes the image sensor for receiving the image of the reflection light and for converting it into a detected image signal. An image processor is provided for detecting defects on patterns formed on the sample in accordance with the detected image signal.
公开/授权文献
- US20070002318A1 Method and apparatus for inspecting pattern defects 公开/授权日:2007-01-04
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