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    Method and apparatus for inspecting pattern defects
    1.
    发明申请
    Method and apparatus for inspecting pattern defects 有权
    检查图案缺陷的方法和装置

    公开(公告)号：US20070002318A1

    公开(公告)日：2007-01-04

    申请号：US11518195

    申请日：2006-09-11

    申请人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe

    发明人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe

    IPC分类号： G01N21/88

    CPC分类号： G01N21/95607 ,  G01N21/9501 ,  G01N21/95684 ,  G01N2021/9513

    摘要： A method and apparatus for inspecting pattern defects emitting a laser beam, adjusting a light-amount of the laser beam, converting the light-amount adjusted laser beam into a slit-like laser light flux, lowering coherency of the slit-like laser light flux, and irradiating a sample with the coherence reduced slit-like laser light flux. An image of reflection light from the sample is obtained, and a detector is provided which includes the image sensor for receiving the image of the reflection light and for converting it into a detected image signal. An image processor is provided for detecting defects on patterns formed on the sample in accordance with the detected image signal.

    摘要翻译： 用于检查发射激光束的图案缺陷的方法和装置，调节激光束的光量，将调整光量的激光束转换成狭缝状激光束，降低狭缝状激光光束的相干性 并且用相干减少的狭缝状激光束照射样品。 获得来自样品的反射光的图像，并且提供检测器，其包括用于接收反射光的图像并将其转换成检测到的图像信号的图像传感器。 提供了一种图像处理器，用于根据检测到的图像信号检测在样本上形成的图案上的缺陷。

    Method and apparatus for inspecting pattern defects
    3.
    发明申请
    Method and apparatus for inspecting pattern defects 有权
    检查图案缺陷的方法和装置

    公开(公告)号：US20050264800A1

    公开(公告)日：2005-12-01

    申请号：US11192021

    申请日：2005-07-29

    申请人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe

    发明人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe

    IPC分类号： G01N21/00 ,  G01N21/95 ,  G01N21/956

    CPC分类号： G01N21/95607 ,  G01N21/9501 ,  G01N21/95684 ,  G01N2021/9513

    摘要： A method and apparatus for inspecting pattern defects emitting a laser beam, adjusting a light-amount of the laser beam, converting the light-amount adjusted laser beam into a slit-like laser light flux, lowering coherency of the slit-like laser light flux, and irradiating a sample with the coherence reduced slit-like laser light flux. An image of reflection light from the sample is obtained, and a detector is provided which includes the image sensor for receiving the image of the reflection light and for converting it into a detected image signal. An image processor is provided for detecting defects on patterns formed on the sample in accordance with the detected image signal.

    摘要翻译： 用于检查发射激光束的图案缺陷的方法和装置，调节激光束的光量，将调整光量的激光束转换成狭缝状激光束，降低狭缝状激光光束的相干性 并且用相干减少的狭缝状激光束照射样品。 获得来自样品的反射光的图像，并且提供检测器，其包括用于接收反射光的图像并将其转换成检测到的图像信号的图像传感器。 提供了一种图像处理器，用于根据检测到的图像信号检测在样本上形成的图案上的缺陷。

    Method and apparatus for inspecting a pattern formed on a substrate
    4.
    发明申请
    Method and apparatus for inspecting a pattern formed on a substrate 失效
    用于检查在基板上形成的图案的方法和装置

    公开(公告)号：US20050206888A1

    公开(公告)日：2005-09-22

    申请号：US11131379

    申请日：2005-05-18

    申请人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

    发明人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

    IPC分类号： G01N21/956 ,  G03F7/20 ,  G03F9/00

    CPC分类号： G03F7/7065 ,  G01N21/95684

    摘要： A pattern inspection apparatus includes a light source which emits ultraviolet light, an irradiator which reduces coherency of the ultraviolet light and irradiates the coherency reduced ultraviolet light onto a specimen on which a pattern is formed through an objective lens, and a focus control means which projects light on the specimen from outside the objective lens, detects light reflected from the specimen by the projection and adjusts a height of the specimen relative to the objective lens. The apparatus further includes an image which forms an image of the specimen irradiated with the ultraviolet light and detects the formed image with a sensor, an image processor which processes a signal outputted from the sensor to detect a defect of the specimen, and a display which displays information of the defect detected by the image processor.

    摘要翻译： 图案检查装置包括发出紫外线的光源，减少紫外线的相干性并将相干性降低的紫外光照射到通过物镜形成图案的样本的照射器，以及投影 从物镜外部对样品进行光照射，通过投影检测从样品反射的光，并调整样本相对于物镜的高度。 该装置还包括形成用紫外线照射的样本的图像并用传感器检测形成的图像的图像，处理从传感器输出的信号以检测样本的缺陷的图像处理器，以及显示器 显示由图像处理器检测到的缺陷的信息。

    Method and apparatus for inspecting a pattern formed on a substrate
    5.
    发明授权
    Method and apparatus for inspecting a pattern formed on a substrate 失效
    用于检查在基板上形成的图案的方法和装置

    公开(公告)号：US07646477B2

    公开(公告)日：2010-01-12

    申请号：US11131379

    申请日：2005-05-18

    申请人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

    发明人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

    IPC分类号： G01N21/00

    CPC分类号： G03F7/7065 ,  G01N21/95684

    摘要： A pattern inspection apparatus includes a light source which emits ultraviolet light, an irradiator which reduces coherency of the ultraviolet light and irradiates the coherency reduced ultraviolet light onto a specimen on which a pattern is formed through an objective lens, and a focus control means which projects light on the specimen from outside the objective lens, detects light reflected from the specimen by the projection and adjusts a height of the specimen relative to the objective lens. The apparatus further includes an image which forms an image of the specimen irradiated with the ultraviolet light and detects the formed image with a sensor, an image processor which processes a signal outputted from the sensor to detect a defect of the specimen, and a display which displays information of the defect detected by the image processor.

    摘要翻译： 图案检查装置包括发出紫外线的光源，减少紫外线的相干性并将相干性降低的紫外光照射到通过物镜形成图案的样本的照射器，以及投影 从物镜外部对样品进行光照射，通过投影检测从样品反射的光，并调整样本相对于物镜的高度。 该装置还包括形成用紫外线照射的样本的图像并用传感器检测形成的图像的图像，处理从传感器输出的信号以检测样本的缺陷的图像处理器，以及显示器 显示由图像处理器检测到的缺陷的信息。

    Method and apparatus for inspecting a pattern formed on a substrate
    6.
    发明授权
    Method and apparatus for inspecting a pattern formed on a substrate 失效
    用于检查在基板上形成的图案的方法和装置

    公开(公告)号：US06900888B2

    公开(公告)日：2005-05-31

    申请号：US10650756

    申请日：2003-08-29

    申请人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

    发明人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

    IPC分类号： G01N21/956 ,  G03F7/20 ,  G03F9/00 ,  G01N21/88

    CPC分类号： G03F7/7065 ,  G01N21/95684

    摘要： The inventive method and apparatus for detecting defects of a microscopic circuit pattern by imaging the pattern at high resolution comprises an objective lens for imaging the subject pattern, a laser illumination means for illuminating the pupil of the objective lens, means of diminishing the coherency of the laser illumination, an accumulative detector, and means of processing the signal detected by the detector. The method and apparatus are capable of imaging the subject pattern at high sensitivity and high speed based on the illumination by a short wavelength, which is indispensable for the enhancement of resolution, particularly based on a laser light source which is advantageous for practicing, with a resulting image being the same or better in quality as compared with an image resulting from the ordinary discharge tube illumination, whereby it is possible to detect microscopic defects at high sensitivity.

    摘要翻译： 用于通过以高分辨率对图案进行成像来检测微观电路图案的缺陷的本发明的方法和装置包括用于对被摄体图案进行成像的物镜，用于照射物镜的瞳孔的激光照明装置，降低该物镜的相干性的手段 激光照明，累积检测器，以及处理由检测器检测到的信号的装置。 该方法和装置能够以高灵敏度和高速度基于短波长的照明来对被摄体图案进行成像，这对于提高分辨率是不可或缺的，特别是基于有利于实践的激光光源 与普通放电管照明产生的图像相比，所得到的图像的质量相同或更好，从而可以以高灵敏度检测微观缺陷。

    Method And Apparatus For Inspecting A Pattern Formed On A Substrate
    7.
    发明申请
    Method And Apparatus For Inspecting A Pattern Formed On A Substrate 有权
    检查基板上形成的图案的方法和装置

    公开(公告)号：US20100104173A1

    公开(公告)日：2010-04-29

    申请号：US12649898

    申请日：2009-12-30

    申请人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

    发明人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

    IPC分类号： G06K9/62

    CPC分类号： G03F7/7065 ,  G01N21/95684

    摘要： A pattern inspection method and apparatus in which a deep ultraviolet light or an ultraviolet light is irradiated onto a specimen on which a pattern is formed, an image of the specimen which is irradiated with the deep ultraviolet light or the ultraviolet light is formed and the formed image is detected with a rear-surface irradiation type image sensor, which is sensitive to wavelengths of no greater than 400 nmm. A signal outputted from the image sensor is processed so as to detect a defect of the specimen by converting an analog image signal outputted from the image sensor to a digital image signal with an A/D converter, and a display displays information of the defect detected.

    摘要翻译： 将深紫外光或紫外线照射到形成有图案的试样上的图案检查方法和装置形成了被深紫外线或紫外线照射的样本的图像，形成 使用对不大于400nm的波长敏感的背面照射型图像传感器来检测图像。 处理从图像传感器输出的信号，以便通过用A / D转换器将从图像传感器输出的模拟图像信号转换为数字图像信号来检测样本的缺陷，并且显示器显示检测到的缺陷的信息 。

    Method And Apparatus For Inspecting Pattern Defects
    8.
    发明申请
    Method And Apparatus For Inspecting Pattern Defects 有权
    检查图案缺陷的方法和装置

    公开(公告)号：US20090153840A1

    公开(公告)日：2009-06-18

    申请号：US12366003

    申请日：2009-02-05

    申请人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe

    发明人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe

    IPC分类号： G01N21/88 ,  G01N21/00

    CPC分类号： G01N21/95684 ,  G01N2021/9513

    摘要： An apparatus and method for inspecting defects includes an illuminator for irradiating light having an ultraviolet wavelength emitted from a light source onto a specimen through a reflection objective lens, an image-former for forming an image of light reflected from the specimen by the illumination of the light from the illuminator, which is passed through at least the reflection objective lens, a detector which detects the image of light formed by the image-former with an image sensor, and an image processor for processing a signal output from the detector to detect defects on the specimen. The image sensor is a reverse-surface irradiation type image sensor.

    摘要翻译： 用于检查缺陷的装置和方法包括：照射器，用于将通过光源发射的具有从光源发射的紫外线波长的光通过反射物镜照射到样本上;成像器，用于形成从样本反射的光的图像， 至少通过反射物镜的照明器的光，用图像传感器检测由成像器形成的光的图像的检测器，以及用于处理从检测器输出的信号以检测缺陷的图像处理器 在标本上。 图像传感器是反面照射型图像传感器。

    Method and apparatus for inspecting a pattern formed on a substrate
    10.
    发明授权
    Method and apparatus for inspecting a pattern formed on a substrate 有权
    用于检查在基板上形成的图案的方法和装置

    公开(公告)号：US08253934B2

    公开(公告)日：2012-08-28

    申请号：US12649898

    申请日：2009-12-30

    申请人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

    发明人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

    IPC分类号： G01N21/00

    CPC分类号： G03F7/7065 ,  G01N21/95684

    摘要： A pattern inspection method and apparatus in which a deep ultraviolet light or an ultraviolet light is irradiated onto a specimen on which a pattern is formed, an image of the specimen which is irradiated with the deep ultraviolet light or the ultraviolet light is formed and the formed image is detected with a rear-surface irradiation type image sensor, which is sensitive to wavelengths of no greater than 400 nmm. A signal outputted from the image sensor is processed so as to detect a defect of the specimen by converting an analog image signal outputted from the image sensor to a digital image signal with an A/D converter, and a display displays information of the defect detected.

    摘要翻译： 将深紫外光或紫外线照射到形成有图案的试样上的图案检查方法和装置形成了被深紫外线或紫外线照射的样本的图像，形成 使用对不大于400nm的波长敏感的背面照射型图像传感器来检测图像。 处理从图像传感器输出的信号，以便通过用A / D转换器将从图像传感器输出的模拟图像信号转换为数字图像信号来检测样本的缺陷，并且显示器显示检测到的缺陷的信息 。