中科微点-全球专利检索

  1. Login
  2. Sign Up
Invention Grant
US07498393B2 Fluorinated compound, fluoropolymer, resist composition, and composition for resist protective film 失效
氟化合物，含氟聚合物，抗蚀剂组合物和抗蚀剂保护膜的组合物

Fluorinated compound, fluoropolymer, resist composition, and composition for resist protective film
Abstract:
A fluoropolymer having functional groups and having high transparency in a wide wavelength range is provided, and a resist composition and a composition for a resist protective film, comprising the fluoropolymer, wherein the fluoropolymer has monomer units formed by cyclopolymerization of a fluorinated diene represented by the formula (1): CF2═CFCF2C(CF3)(OR1)—(CH2)nCR2═CHR3  (1) wherein R1 is a hydrogen atom, an alkyl group having at most 20 carbon atoms, or (CH2)aCOOR4 (wherein a is 0 or 1, and R4 is a hydrogen atom or an alkyl group having at most 20 carbon atoms), each of R2 and R3, which are independent of each other, is a hydrogen atom or an alkyl group having at most 12 carbon atoms, and n is 0 or 2, provided that when n is 0, at least one of R1, R2 and R3 is other than a hydrogen atom.
Abstract(Chinese):

提供具有官能团并且在宽波长范围内具有高透明度的含氟聚合物，以及抗蚀剂组合物和用于抗蚀剂保护膜的组合物，其包含含氟聚合物，其中所述含氟聚合物具有通过氟代二烯表示的氟化二烯的环化聚合形成的单体单元 CF2-CFCF2C（CF3）（OR1） - （CH2）nCR2-CHR3（1）<α-in-line-formula description =“In-line formula”end =“lead” line-formula description =“In-line Formulas”end =“tail”？>其中R1是氢原子，最多20个碳原子的烷基或（CH2）aCOOR4（其中a是0或1，R4 是氢原子或具有至多20个碳原子的烷基），R 2和R 3各自独立地为氢原子或至多12个碳原子的烷基，n为0或2 条件是当n为0时，R 1，R 2和R 3中的至少一个不是氢原子。

Public/Granted literature
Information query
Espacenet
Patent Agency Ranking
0/0