发明授权
US07505879B2 Method for generating multivariate analysis model expression for processing apparatus, method for executing multivariate analysis of processing apparatus, control device of processing apparatus and control system for processing apparatus 有权
用于生成处理装置的多变量分析模型表达式的方法,用于执行处理装置的多元分析的方法,处理装置的控制装置和处理装置的控制系统

  • 专利标题: Method for generating multivariate analysis model expression for processing apparatus, method for executing multivariate analysis of processing apparatus, control device of processing apparatus and control system for processing apparatus
  • 专利标题(中): 用于生成处理装置的多变量分析模型表达式的方法,用于执行处理装置的多元分析的方法,处理装置的控制装置和处理装置的控制系统
  • 申请号: US11003829
    申请日: 2004-12-06
  • 公开(公告)号: US07505879B2
    公开(公告)日: 2009-03-17
  • 发明人: Masayuki TomoyasuHin OhHideki Tanaka
  • 申请人: Masayuki TomoyasuHin OhHideki Tanaka
  • 申请人地址: JP Tokyo
  • 专利权人: Tokyo Electron Limited
  • 当前专利权人: Tokyo Electron Limited
  • 当前专利权人地址: JP Tokyo
  • 代理机构: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
  • 优先权: JP2002-163869 20020605; JP2002-168653 20020610
  • 主分类号: G06F7/60
  • IPC分类号: G06F7/60
Method for generating multivariate analysis model expression for processing apparatus, method for executing multivariate analysis of processing apparatus, control device of processing apparatus and control system for processing apparatus
摘要:
According to the present invention, multivariate analysis model expressions are generated for a plasma processing apparatus 100A and a plasma processing apparatus 100B by executing a multivariate analysis of detection data provided by a plurality of sensors included in each plasma processing apparatus when the plasma processing apparatuses 100A and 100B operate based upon first setting data. Then, when the plasma processing apparatus 100A operates based upon new second setting data, detection data provided by the plurality of sensors in the plasma processing apparatus 100A are used to generate a corresponding multivariate analysis model expression, and by using the new multivariate analysis model expression corresponding to the plasma processing apparatus 100A generated based upon the second setting data and to the plasma processing apparatus 100B, a multivariate analysis model expression corresponding to the new second setting data is generated four the plasma processing apparatus 100B.
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