Invention Grant
- Patent Title: Phase-shifting masks with sub-wavelength diffractive optical elements
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Application No.: US11242165Application Date: 2005-09-30
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Publication No.: US07512926B2Publication Date: 2009-03-31
- Inventor: Bin Hu , Vivek Singh , Yan Borodovsky
- Applicant: Bin Hu , Vivek Singh , Yan Borodovsky
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agent George Chen
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G03G13/00 ; G03H3/00

Abstract:
The present invention discloses a method of designing a set of two tiled masks, as well as, a mask including: a first tile, the first tile being transparent to a light, the first tile having a first characteristic linear dimension that is 15% or less of a wavelength of the light; a second tile, the second tile being transparent to the light, the second tile having a second characteristic linear dimension that is 15% or less of the wavelength of the light; and a third tile, the third tile being opaque to the light, the third tile having a third characteristic linear dimension that is 15% or less of the wavelength of the light.
Public/Granted literature
- US20070094959A1 Phase-shifting masks with sub-wavelength diffractive optical elements Public/Granted day:2007-05-03
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