发明授权
US07519885B2 Monitoring a monolayer deposition (MLD) system using a built-in self test (BIST) table
失效
使用内置自检（BIST）表监测单层沉积（MLD）系统
- 专利标题： Monitoring a monolayer deposition (MLD) system using a built-in self test (BIST) table
- 专利标题（中）： 使用内置自检（BIST）表监测单层沉积（MLD）系统
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申请号： US11278382申请日： 2006-03-31
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公开(公告)号： US07519885B2公开(公告)日： 2009-04-14
- 发明人: Sanjeev Kaushal , Pradeep Pandey , Kenji Sugishima
- 申请人： Sanjeev Kaushal , Pradeep Pandey , Kenji Sugishima
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Wood, Herron & Evans, LLP
- 主分类号： G06F11/00
- IPC分类号： G06F11/00 ; G11C29/00 ; G06F11/30 ; G06F19/00 ; G01R31/26
摘要：
A method of monitoring a processing system in real-time using low-pressure based modeling techniques that include processing one or more of wafers in a processing chamber; determining a measured dynamic process response for a rate of change for a process parameter; executing a real-time dynamic model to generate a predicted dynamic process response; determining a dynamic estimation error using a difference between the predicted dynamic process response and the expected process response; and comparing the dynamic estimation error to operational limits.
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