发明授权
- 专利标题： Magnetic monitoring of a Faraday cup for an ion implanter
- 专利标题（中）： 用于离子注入机的法拉第杯的磁性监测
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申请号： US11608595申请日： 2006-12-08
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公开(公告)号： US07521691B2公开(公告)日： 2009-04-21
- 发明人: Joseph P. Dzengeleski , Morgan D. Evans , Jay Scheuer , Ashwin Shetty , Kenneth Swenson
- 申请人： Joseph P. Dzengeleski , Morgan D. Evans , Jay Scheuer , Ashwin Shetty , Kenneth Swenson
- 申请人地址： US MA Gloucester
- 专利权人： Varian Semiconductor Equipment Associates, Inc.
- 当前专利权人： Varian Semiconductor Equipment Associates, Inc.
- 当前专利权人地址： US MA Gloucester
- 主分类号： G01K1/08
- IPC分类号： G01K1/08 ; H01J3/14 ; H01J3/26 ; A61N5/00 ; G21G5/00 ; G21K5/10 ; H01J37/08
摘要：
This disclosure provides an approach for magnetic monitoring of a Faraday cup for an ion implanter. In this disclosure, there is a vacuum chamber and a Faraday cup located within the vacuum chamber. The Faraday cup is configured to move within the path of an ion beam entering the vacuum chamber. A magnetic monitor located about the vacuum chamber, is configured to distinguish a magnetic field associated with the Faraday cup from stray magnetic fields.
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