发明授权
US07538333B1 Contactless charge measurement of product wafers and control of corona generation and deposition
失效
产品晶圆的非接触式电荷测量和电晕发生和沉积的控制
- 专利标题： Contactless charge measurement of product wafers and control of corona generation and deposition
- 专利标题（中）： 产品晶圆的非接触式电荷测量和电晕发生和沉积的控制
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申请号： US11460517申请日： 2006-07-27
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公开(公告)号： US07538333B1公开(公告)日： 2009-05-26
- 发明人: Amin Samsavar , John M. Schmidt , Rainer Schierle , Gregory S. Horner , Thomas G. Miller , Zhiwei Xu , Xiaofeng Hu , Jianou Shi , Sergio Edelstein
- 申请人： Amin Samsavar , John M. Schmidt , Rainer Schierle , Gregory S. Horner , Thomas G. Miller , Zhiwei Xu , Xiaofeng Hu , Jianou Shi , Sergio Edelstein
- 申请人地址： US CA Milpitas
- 专利权人： KLA-Tencor Technologies Corporation
- 当前专利权人： KLA-Tencor Technologies Corporation
- 当前专利权人地址： US CA Milpitas
- 代理机构： Baker & McKenzie LLP
- 主分类号： H01J37/30
- IPC分类号： H01J37/30 ; H01J37/317 ; G01R31/26
摘要：
Systems and methods for determining a property of a specimen are provided. The specimen may be a product wafer. The method may include biasing a focused spot on the specimen. The method may also include measuring a parameter of a measurement spot on the specimen. The measurement spot may overlap the focused spot. In addition, the method may include determining the property of the specimen from the measured parameter. Systems and methods for varying the performance of a corona source are also provided. The method may include altering a property of the environment within the corona source. The property may include, but is not limited to, temperature, pressure, humidity, and/or partial pressure of a gas within the corona source.
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