发明授权
US07567022B2 Method for forming perovskite type oxide thin film, piezoelectric element, liquid discharge head, and liquid discharge apparatus
失效
用于形成钙钛矿型氧化物薄膜,压电元件,液体排出头和液体排出装置的方法
- 专利标题: Method for forming perovskite type oxide thin film, piezoelectric element, liquid discharge head, and liquid discharge apparatus
- 专利标题(中): 用于形成钙钛矿型氧化物薄膜,压电元件,液体排出头和液体排出装置的方法
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申请号: US11582403申请日: 2006-10-18
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公开(公告)号: US07567022B2公开(公告)日: 2009-07-28
- 发明人: Tetsuro Fukui , Kenichi Takeda , Takanori Matsuda , Hiroshi Funakubo , Shintaro Yokoyama
- 申请人: Tetsuro Fukui , Kenichi Takeda , Takanori Matsuda , Hiroshi Funakubo , Shintaro Yokoyama
- 申请人地址: JP Tokyo JP Tokyo
- 专利权人: Canon Kabushiki Kaisha,Tokyo Institute of Technology
- 当前专利权人: Canon Kabushiki Kaisha,Tokyo Institute of Technology
- 当前专利权人地址: JP Tokyo JP Tokyo
- 代理机构: Fitzpatrick, Cella, Harper & Scinto
- 优先权: JP2005-305815 20051020
- 主分类号: H01L41/00
- IPC分类号: H01L41/00 ; H01L41/187
摘要:
To provide a film forming method capable of obtaining a high-quality perovskite type oxide thin film, piezoelectric element having a piezoelectric substance constituted of the thin film formed by the film forming method, liquid discharge head having the piezoelectric element and liquid discharge apparatus having the liquid discharge head. A method for forming a perovskite type oxide thin film having a composition expressed by (A1x, A2y A3z) (B1j, B2k, B3l, B4m B5n)Op is included, which is a film forming method having a plurality of steps for supplying a material containing the elements onto the substrate, dividing the elements A1 to A3 and B1 to B5 into a plurality of groups and supplying each material containing the elements included in the groups onto the substrate in separate steps.
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