Invention Grant
- Patent Title: Method for measurement of a device under test
- Patent Title (中): 被测设备的测量方法
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Application No.: US11765019Application Date: 2007-06-19
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Publication No.: US07573283B2Publication Date: 2009-08-11
- Inventor: Axel Schmidt , Frank Fehrmann , Ulf Hackius , Stojan Kanev , Steffen Laube , Jorg Kiesewetter
- Applicant: Axel Schmidt , Frank Fehrmann , Ulf Hackius , Stojan Kanev , Steffen Laube , Jorg Kiesewetter
- Applicant Address: DE Sacka
- Assignee: SUSS Micro Tec Test Systems GmbH
- Current Assignee: SUSS Micro Tec Test Systems GmbH
- Current Assignee Address: DE Sacka
- Agency: Heslin Rothenberg Farley & Mesiti P.C.
- Main IPC: G01R31/06
- IPC: G01R31/06

Abstract:
A method is disclosed for measurement of wafers and other semiconductor components in a probe station, which serves for examination and testing of electronic components. The device under test is held by a chuck and at least one electric probe by a probe support and the device under test and the probe are selectively positioned relative to each other by a positioning device with electric drives and the device under test is contacted. The drive of the positioning device remains in a state of readiness until establishment of contact and is switched off after establishment of contact and before measurement of the device under test.
Public/Granted literature
- US20080315903A1 METHOD FOR MEASUREMENT OF A DEVICE UNDER TEST Public/Granted day:2008-12-25
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