Invention Grant
- Patent Title: Inspection method and inspection apparatus
- Patent Title (中): 检验方法和检验仪器
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Application No.: US11605239Application Date: 2006-11-29
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Publication No.: US07586593B2Publication Date: 2009-09-08
- Inventor: Akira Hamamatsu , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Takahiro Jingu , Sachio Uto
- Applicant: Akira Hamamatsu , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Takahiro Jingu , Sachio Uto
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Tech Electronics Engineering Co., Ltd.
- Current Assignee: Hitachi High-Tech Electronics Engineering Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2002-347134 20021129
- Main IPC: G01N21/00
- IPC: G01N21/00
Abstract:
The present invention provides an inspection apparatus and inspection method. The inspection apparatus includes a stage mechanism for supporting an object under inspection. A spatial filter is provided in the detection optical system to inspect the object. A printer is used to print the results of the spatial filter. The spatial filter can be provided in the form of a Fourier transformed image.
Public/Granted literature
- US20070070339A1 Inspection method and inspection apparatus Public/Granted day:2007-03-29
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