发明授权
- 专利标题： Inspection method and inspection apparatus
- 专利标题（中）： 检验方法和检验仪器
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申请号： US11605239申请日： 2006-11-29
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公开(公告)号： US07586593B2公开(公告)日： 2009-09-08
- 发明人: Akira Hamamatsu , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Takahiro Jingu , Sachio Uto
- 申请人： Akira Hamamatsu , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Takahiro Jingu , Sachio Uto
- 申请人地址： JP Tokyo
- 专利权人： Hitachi High-Tech Electronics Engineering Co., Ltd.
- 当前专利权人： Hitachi High-Tech Electronics Engineering Co., Ltd.
- 当前专利权人地址： JP Tokyo
- 代理机构： Antonelli, Terry, Stout & Kraus, LLP.
- 优先权： JP2002-347134 20021129
- 主分类号： G01N21/00
- IPC分类号： G01N21/00
摘要：
The present invention provides an inspection apparatus and inspection method. The inspection apparatus includes a stage mechanism for supporting an object under inspection. A spatial filter is provided in the detection optical system to inspect the object. A printer is used to print the results of the spatial filter. The spatial filter can be provided in the form of a Fourier transformed image.
公开/授权文献
- US20070070339A1 Inspection method and inspection apparatus 公开/授权日：2007-03-29
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