发明授权
- 专利标题: Method for extending time between chamber cleaning processes
- 专利标题(中): 在室清洁过程之间延长时间的方法
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申请号: US10814713申请日: 2004-03-31
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公开(公告)号: US07604841B2公开(公告)日: 2009-10-20
- 发明人: Raymond Joe , John Gumpher , Anthony Dip
- 申请人: Raymond Joe , John Gumpher , Anthony Dip
- 申请人地址: JP Tokyo
- 专利权人: Tokyo Electron Limited
- 当前专利权人: Tokyo Electron Limited
- 当前专利权人地址: JP Tokyo
- 代理机构: Wood, Herron & Evans, LLP
- 主分类号: C23C16/30
- IPC分类号: C23C16/30
摘要:
A method for extending time between chamber cleaning processes in a process chamber of a processing system. A particle-reducing film is formed on a chamber component in the process chamber to reduce particle formation in the process chamber during substrate processing, at least one substrate is introduced into the process chamber, a manufacturing process is performed in the process chamber, and the at least one substrate is removed from the process chamber. The particle-reducing film may be deposited on a clean chamber component or on a material deposit formed on a chamber component. Alternatively, the particle-reducing film may be formed by chemically modifying at least a portion of a material deposit on a chamber component. The particle-reducing film may be formed after each manufacturing process or at selected intervals after multiple manufacturing processes.