Invention Grant
- Patent Title: Etched-facet ridge lasers with etch-stop
- Patent Title (中): 具有蚀刻停止的蚀刻面脊激光器
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Application No.: US11644828Application Date: 2006-12-26
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Publication No.: US07606277B2Publication Date: 2009-10-20
- Inventor: Alex A. Behfar , Cristian B. Stagarescu , Alfred T. Schremer
- Applicant: Alex A. Behfar , Cristian B. Stagarescu , Alfred T. Schremer
- Applicant Address: US NY Ithaca
- Assignee: Binoptics Corporation
- Current Assignee: Binoptics Corporation
- Current Assignee Address: US NY Ithaca
- Agency: Jones, Tullar & Cooper, P.C.
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
A photonic device incorporate an epitaxial structure having an active region, and which includes a wet etch stop layer above, but close to, the active region. An etched-facet ridge laser is fabricated on the epitaxial structure by dry etching followed by wet etching. The dry etch is designed to stop before reading the depth needed to form the ridge. The wet etch completes the formation of the ridge and stops at the wet etch stop layer.
Public/Granted literature
- US20080151955A1 Etched-facet ridge lasers with etch-stop Public/Granted day:2008-06-26
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