Invention Grant
- Patent Title: Automated selection of X-ray reflectometry measurement locations
- Patent Title (中): 自动选择X射线反射测量位置
-
Application No.: US12232259Application Date: 2008-09-12
-
Publication No.: US07649978B2Publication Date: 2010-01-19
- Inventor: Isaac Mazor , Alex Dikopoltsev , Boris Yokhin , Dileep Agnihotri , Tzachi Rafaeli , Alex Tokar , David Berman , Moshe Beylin
- Applicant: Isaac Mazor , Alex Dikopoltsev , Boris Yokhin , Dileep Agnihotri , Tzachi Rafaeli , Alex Tokar , David Berman , Moshe Beylin
- Applicant Address: IL Migdal Ha'emek
- Assignee: Jordan Valley Semiconductors Ltd.
- Current Assignee: Jordan Valley Semiconductors Ltd.
- Current Assignee Address: IL Migdal Ha'emek
- Agency: Smith, Gambrell & Russell, LLP
- Main IPC: G01B15/02
- IPC: G01B15/02

Abstract:
The computer-implemented method for inspection of a sample includes defining a plurality of locations on a surface of the sample, irradiating the surface at each of the locations with a beam of X-rays, and measuring an angular distribution of the X-rays that are emitted from the surface responsively to the beam, so as to produce a respective plurality of X-ray spectra. The X-ray spectra are analyzed to produce respective figures-of-merit indicative of a measurement quality of the X-ray spectra at the respective location. One or more locations are selected out of the plurality of locations responsively to the figures-of-merit, and a property of the sample is estimated using the X-ray spectra measured at the selected location.
Public/Granted literature
- US20090074141A1 Automated selection of x-ray reflectometry measurement locations Public/Granted day:2009-03-19
Information query