发明授权
- 专利标题: Photoelectric conversion device, method of manufacturing photoelectric conversion device, and image pickup system
- 专利标题(中): 光电转换装置,光电转换装置的制造方法以及摄像系统
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申请号: US12326138申请日: 2008-12-02
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公开(公告)号: US07679116B2公开(公告)日: 2010-03-16
- 发明人: Hiroshi Yuzurihara , Ryuichi Mishima , Takanori Watanabe , Takeshi Ichikawa , Seiichi Tamura
- 申请人: Hiroshi Yuzurihara , Ryuichi Mishima , Takanori Watanabe , Takeshi Ichikawa , Seiichi Tamura
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Fitzpatrick, Cella, Harper & Scinto
- 优先权: JP2003-415011 20031212; JP2004-252310 20040831
- 主分类号: H01L31/062
- IPC分类号: H01L31/062 ; H01L31/113
摘要:
A photoelectric conversion device comprising a semiconductor substrate of a first conduction type, and a photoelectric conversion element having an impurity region of the first conduction type and a plurality of impurity regions of a second conduction type opposite to the first conduction type. The plurality of second-conduction-type impurity regions include at least a first impurity region, a second impurity region provided between the first impurity region and a surface of the substrate, and a third impurity region provided between the second impurity region and the surface of the substrate. A concentration C1 corresponding to a peak of the impurity concentration in the first impurity region, a concentration C2 corresponding to a peak of the impurity concentration in the second impurity region and a concentration C3 corresponding to a peak of the impurity concentration in the third impurity region satisfy the following relationship: C2
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