发明授权
- 专利标题: Defect inspection system
- 专利标题(中): 缺陷检查系统
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申请号: US12081107申请日: 2008-04-10
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公开(公告)号: US07733474B2公开(公告)日: 2010-06-08
- 发明人: Kenji Aiko , Shuichi Chikamatsu , Minori Noguchi , Hisafumi Iwata
- 申请人: Kenji Aiko , Shuichi Chikamatsu , Minori Noguchi , Hisafumi Iwata
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: McDermott Will & Emery LLP
- 优先权: JP2007-106082 20070413
- 主分类号: G01N21/00
- IPC分类号: G01N21/00
摘要:
A defect inspection system can suppress an effect of light from a sample rough surface or a regular circuit pattern and increase a gain of light from a defect such as a foreign material to detect the defect on the sample surface with high sensitivity. When a lens with a large NA value is used, an oblique detection optics system receives the light from the defect at a reduced elevation angle with respect to the sample surface to reduce light from the sample rough surface, an oxide film rough bottom surface, and a circuit pattern, and increases the amount of the light from the defect and detected. The diameter of a lens is smaller than the diameter of a second lens, resulting in a reduction in the ability to focus the scattered light.
公开/授权文献
- US20080291436A1 Defect inspection system 公开/授权日:2008-11-27
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