发明授权
US07740736B2 Methods and apparatus for preventing plasma un-confinement events in a plasma processing chamber
有权
用于防止等离子体处理室中的等离子体非约束事件的方法和装置
- 专利标题: Methods and apparatus for preventing plasma un-confinement events in a plasma processing chamber
- 专利标题(中): 用于防止等离子体处理室中的等离子体非约束事件的方法和装置
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申请号: US11537515申请日: 2006-09-29
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公开(公告)号: US07740736B2公开(公告)日: 2010-06-22
- 发明人: Andreas Fischer , Rajinder Dhindsa
- 申请人: Andreas Fischer , Rajinder Dhindsa
- 申请人地址: US CA Fremont
- 专利权人: Lam Research Corporation
- 当前专利权人: Lam Research Corporation
- 当前专利权人地址: US CA Fremont
- 代理机构: IP Strategy Group, P.C.
- 主分类号: C23F1/00
- IPC分类号: C23F1/00 ; H01L21/306 ; B05B5/025 ; B05C5/02 ; C23C16/00
摘要:
Techniques and apparatus for substantially reducing and/or preventing the occurrence of plasma un-confinement events, including one or more of shielding a gap disposed between chamber components and along a RF current path with a dielectric shielding structure, shielding a sharp component structure with a dielectric shielding structure, and keeping the gap between adjacent pairs of plasma confinement rings smaller than the worst-case DeBye length for the plasma.
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