发明授权
US07745098B2 Polymer compound, positive resist composition and method of forming resist pattern 有权
高分子化合物,正性抗蚀剂组合物和形成抗蚀图案的方法

Polymer compound, positive resist composition and method of forming resist pattern
摘要:
A polymer compound having a structural unit (a0) represented by a general formula (a0-1) shown below, and a structural unit (a1) that is derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group but is not classified as said structural unit (a0). [wherein, R represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; A represents a divalent aliphatic cyclic group that may have a substituent; B represents a divalent hydrocarbon group that may have a substituent; r represents an integer of 0 or 1; and R1 represents an acid dissociable, dissolution inhibiting group]
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