发明授权
US07745098B2 Polymer compound, positive resist composition and method of forming resist pattern
有权
高分子化合物,正性抗蚀剂组合物和形成抗蚀图案的方法
- 专利标题: Polymer compound, positive resist composition and method of forming resist pattern
- 专利标题(中): 高分子化合物,正性抗蚀剂组合物和形成抗蚀图案的方法
-
申请号: US12198557申请日: 2008-08-26
-
公开(公告)号: US07745098B2公开(公告)日: 2010-06-29
- 发明人: Takahiro Dazai , Takayoshi Mori , Hiroaki Shimizu , Kyoko Ohshita , Komei Hirahara
- 申请人: Takahiro Dazai , Takayoshi Mori , Hiroaki Shimizu , Kyoko Ohshita , Komei Hirahara
- 申请人地址: JP Kawasaki-shi
- 专利权人: Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人: Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人地址: JP Kawasaki-shi
- 代理机构: Knobbe, Martens, Olson & Bear, LLP
- 优先权: JP2007-229445 20070904
- 主分类号: G03F7/039
- IPC分类号: G03F7/039 ; G03F7/20 ; G03F7/30 ; C08F220/18
摘要:
A polymer compound having a structural unit (a0) represented by a general formula (a0-1) shown below, and a structural unit (a1) that is derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group but is not classified as said structural unit (a0). [wherein, R represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; A represents a divalent aliphatic cyclic group that may have a substituent; B represents a divalent hydrocarbon group that may have a substituent; r represents an integer of 0 or 1; and R1 represents an acid dissociable, dissolution inhibiting group]
公开/授权文献
信息查询
IPC分类: