公开(公告)号：US07745098B2

公开(公告)日：2010-06-29

申请号：US12198557

申请日：2008-08-26

申请人： Takahiro Dazai ,  Takayoshi Mori ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Komei Hirahara

发明人： Takahiro Dazai ,  Takayoshi Mori ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Komei Hirahara

IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  C08F220/18

CPC分类号： H04B1/123 ,  Y10S430/111 ,  Y10S430/122 ,  Y10S430/126

摘要： A polymer compound having a structural unit (a0) represented by a general formula (a0-1) shown below, and a structural unit (a1) that is derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group but is not classified as said structural unit (a0). [wherein, R represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; A represents a divalent aliphatic cyclic group that may have a substituent; B represents a divalent hydrocarbon group that may have a substituent; r represents an integer of 0 or 1; and R1 represents an acid dissociable, dissolution inhibiting group]

摘要翻译： 具有下述通式（a0-1）表示的结构单元（a0）的高分子化合物和由含有酸解离性，溶解抑制基但不分类为 所述结构单元（a0）。 [式中，R表示氢原子，低级烷基或卤代低级烷基; A表示可以具有取代基的二价脂肪族环状基团。 B表示可以具有取代基的二价烃基; r表示0或1的整数; R1表示酸解离，溶解抑制基]

公开(公告)号：US20090061356A1

公开(公告)日：2009-03-05

申请号：US12198557

申请日：2008-08-26

申请人： Takahiro Dazai ,  Takayoshi Mori ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Komei Hirahara

发明人： Takahiro Dazai ,  Takayoshi Mori ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Komei Hirahara

IPC分类号： G03C1/053 ,  C08F20/10 ,  G03F7/20 ,  C08F224/00

CPC分类号： H04B1/123 ,  Y10S430/111 ,  Y10S430/122 ,  Y10S430/126

摘要： A polymer compound having a structural unit (a0) represented by a general formula (a0-1) shown below, and a structural unit (a1) that is derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group but is not classified as said structural unit (a0). [wherein, R represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; A represents a divalent aliphatic cyclic group that may have a substituent; B represents a divalent hydrocarbon group that may have a substituent; r represents an integer of 0 or 1; and R1 represents an acid dissociable, dissolution inhibiting group.]

摘要翻译： 具有下述通式（a0-1）表示的结构单元（a0）的高分子化合物和由含有酸解离性，溶解抑制基但不分类为 所述结构单元（a0）。 [式中，R表示氢原子，低级烷基或卤代低级烷基; A表示可以具有取代基的二价脂肪族环状基团。 B表示可以具有取代基的二价烃基; r表示0或1的整数; R1表示酸解离，溶解抑制基团。

公开(公告)号：US20090023097A1

公开(公告)日：2009-01-22

申请号：US12174804

申请日：2008-07-17

申请人： Takahiro Dazai ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Komei Hirahara

发明人： Takahiro Dazai ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Komei Hirahara

IPC分类号： G03C1/73 ,  G03F7/20

CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  Y10S430/111 ,  Y10S430/122 ,  Y10S430/126

摘要： A positive resist composition including a resin component (A) which exhibits increased solubility in an alkali developing solution under action of acid and has a structural unit (a1) represented by general formula (a1-0-2) shown below, and an acid-generator component (B) which generates acid upon exposure and includes an acid generator (B1) consisting of a compound represented by general formula (b1-12) shown below: wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; X2 represents an acid dissociable, dissolution inhibiting group; and Y2 represents an alkylene group or a divalent aliphatic cyclic group; and R2—O—Y1—SO3−A+  (b1-12) wherein R2 represents a monovalent aromatic organic group; Y1 represents an alkylene group of 1 to 4 carbon atoms which may be substituted with a fluorine atom; and A+ represents a cation.

摘要翻译： 一种正型抗蚀剂组合物，其包含在酸性作用下在碱性显影液中显示出增加的溶解性并具有如下所示的由通式（a1-0-2）表示的结构单元（a1）的树脂组分（A） 发生器组分（B），其在暴露时产生酸，并且包括由以下所示的通式（b1-12）表示的化合物组成的酸产生剂（B1）：其中R表示氢原子，低级烷基或卤代低级烷基 组; X2表示酸解离，溶解抑制基团; 并且Y2表示亚烷基或二价脂族环基; 和<？in-line-formula description =“在线公式”end =“lead”？> R2-O-Y1-SO3-A +（b1-12）<？in-line-formula description =“In-line 式“end =”tail“？>其中R2表示一价芳族有机基团; Y1表示可被氟原子取代的1〜4个碳原子的亚烷基; 而A +代表阳离子。

公开(公告)号：US07741009B2

公开(公告)日：2010-06-22

申请号：US12174804

申请日：2008-07-17

申请人： Takahiro Dazai ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Komei Hirahara

发明人： Takahiro Dazai ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Komei Hirahara

IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30

CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  Y10S430/111 ,  Y10S430/122 ,  Y10S430/126

摘要： A positive resist composition including a resin component (A) which exhibits increased solubility in an alkali developing solution under action of acid and has a structural unit (a1) represented by general formula (a1-0-2) shown below, and an acid-generator component (B) which generates acid upon exposure and includes an acid generator (B1) consisting of a compound represented by general formula (b1-12) shown below: wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; X2 represents an acid dissociable, dissolution inhibiting group; and Y2 represents an alkylene group or a divalent aliphatic cyclic group; and R2—O—Y1—SO3−A+  (b1-12) wherein R2 represents a monovalent aromatic organic group; Y1 represents an alkylene group of 1 to 4 carbon atoms which may be substituted with a fluorine atom; and A+ represents a cation.

摘要翻译： 一种正型抗蚀剂组合物，其包含在酸性作用下在碱性显影液中显示出增加的溶解性并具有如下所示的由通式（a1-0-2）表示的结构单元（a1）的树脂组分（A） 发生器组分（B），其在暴露时产生酸，并且包括由以下所示的通式（b1-12）表示的化合物组成的酸产生剂（B1）：其中R表示氢原子，低级烷基或卤代低级烷基 组; X2表示酸解离，溶解抑制基团; 并且Y2表示亚烷基或二价脂族环基; 和R2-O-Y1-SO3-A +（b1-12）其中R2表示一价芳族有机基团; Y1表示可被氟原子取代的1〜4个碳原子的亚烷基; 而A +代表阳离子。

公开(公告)号：US20090068590A1

公开(公告)日：2009-03-12

申请号：US12204460

申请日：2008-09-04

申请人： Takahiro Dazai ,  Takayoshi Mori ,  Hiroaki Shimizu ,  Kyoko Ohshita

发明人： Takahiro Dazai ,  Takayoshi Mori ,  Hiroaki Shimizu ,  Kyoko Ohshita

IPC分类号： G03F7/004 ,  G03F7/20 ,  C08F28/06

CPC分类号： G03F7/0397 ,  C08F220/18 ,  C08F220/28 ,  C08F220/38 ,  Y10S430/111

摘要： There is provided a positive resist composition including a resin component (A) which displays increased solubility in an alkali developing solution under action of acid, and an acid generator component (B) which generates an acid upon exposure, wherein the resin component (A) includes a polymer compound (A1) containing a structural unit (a0) represented by a general formula (a0-1) shown below, and a structural unit (a1) derived from an acrylate ester which has an acid dissociable, dissolution inhibiting group: (in the formula (a0-1), R represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; two of R′ each independently represents a hydrogen atom, a lower alkyl group, or an alkoxy group of 1 to 5 carbon atoms; X represents an alkylene group of 1 to 5 carbon atoms, an oxygen atom, or a sulfur atom.).

摘要翻译： 提供一种正性抗蚀剂组合物，其包含在酸作用下在碱性显影液中显示增加的溶解性的树脂组分（A）和暴露时产生酸的酸产生剂组分（B），其中树脂组分（A） 包括含有下述通式（a0-1）表示的结构单元（a0）的高分子化合物（A1）和来自具有酸解离性，溶解抑制基团的丙烯酸酯的结构单元（a1）（ 在式（a0-1）中，R表示氢原子，低级烷基或卤代低级烷基; R'两个各自独立地表示氢原子，低级烷基或烷氧基， 5个碳原子; X表示1至5个碳原子的亚烷基，氧原子或硫原子）。

公开(公告)号：US08105749B2

公开(公告)日：2012-01-31

申请号：US12814356

申请日：2010-06-11

申请人： Takahiro Dazai ,  Takayoshi Mori ,  Hiroaki Shimizu ,  Kyoko Ohshita

发明人： Takahiro Dazai ,  Takayoshi Mori ,  Hiroaki Shimizu ,  Kyoko Ohshita

IPC分类号： G03F7/004 ,  G03F7/30 ,  C08F28/06

CPC分类号： G03F7/0397 ,  C08F220/18 ,  C08F220/28 ,  C08F220/38 ,  Y10S430/111

摘要： There is provided a positive resist composition including a resin component (A) which displays increased solubility in an alkali developing solution under action of acid, and an acid generator component (B) which generates an acid upon exposure, wherein the resin component (A) includes a polymer compound (A1) containing a structural unit (a0) represented by a general formula (a0-1) shown below, and a structural unit (a1) derived from an acrylate ester which has an acid dissociable, dissolution inhibiting group: (in the formula (a0-1), R represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; two of R′ each independently represents a hydrogen atom, a lower alkyl group, or an alkoxy group of 1 to 5 carbon atoms; X represents an alkylene group of 1 to 5 carbon atoms, an oxygen atom, or a sulfur atom.).

摘要翻译： 提供一种正性抗蚀剂组合物，其包含在酸作用下在碱性显影液中显示增加的溶解性的树脂组分（A）和暴露时产生酸的酸产生剂组分（B），其中树脂组分（A） 包括含有下述通式（a0-1）表示的结构单元（a0）的高分子化合物（A1）和来自具有酸解离性，溶解抑制基团的丙烯酸酯的结构单元（a1）（ 在式（a0-1）中，R表示氢原子，低级烷基或卤代低级烷基; R'两个各自独立地表示氢原子，低级烷基或烷氧基， 5个碳原子; X表示1至5个碳原子的亚烷基，氧原子或硫原子）。

公开(公告)号：US07488568B2

公开(公告)日：2009-02-10

申请号：US12060695

申请日：2008-04-01

申请人： Takeshi Iwai ,  Hideo Hada ,  Masaru Takeshita ,  Akiya Kawaue ,  Keita Ishiduka ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Tsuyoshi Nakamura ,  Komei Hirahara ,  Yuichi Suzuki ,  Takehiro Seshimo ,  Kensuke Matsuzawa

发明人： Takeshi Iwai ,  Hideo Hada ,  Masaru Takeshita ,  Akiya Kawaue ,  Keita Ishiduka ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Tsuyoshi Nakamura ,  Komei Hirahara ,  Yuichi Suzuki ,  Takehiro Seshimo ,  Kensuke Matsuzawa

IPC分类号： G03F7/004 ,  G03F7/30 ,  C07D333/46

CPC分类号： C07D333/76 ,  G03F7/0045 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/123

摘要： A resist composition including a base component (A) and an acid-generator component (B), the acid-generator component (B) including an acid generator (B1) including a compound represented by general formula (b1-8) shown below (wherein R401 represents an acid dissociable, dissolution inhibiting group; R41 to R43 each independently represents a halogen atom, a halogenated alkyl group, an alkyl group, an acetyl group, an alkoxy group, a carboxy group or a hydroxyalkyl group; Q represents a divalent linking group or a single bond; and X− represents an anion) or an acid generator (B1′) including a compound represented by general formula (b1-9) shown below (wherein R402 and R403 each independently represents a hydrogen atom, an alkyl group or a halogenated alkyl group; R404 represents an alkyl group or a halogenated alkyl group, wherein R403 and R404 may be bonded to each other to form a ring structure; and X− represents an anion).

摘要翻译： 包含基础组分（A）和酸产生剂组分（B）的抗蚀剂组合物，所述酸产生剂组分（B）包括含有下述通式（b1-8）表示的化合物的酸产生剂（B1）（ 其中R401表示酸解离的溶解抑制基团; R 41至R 43各自独立地表示卤素原子，卤代烷基，烷基，乙酰基，烷氧基，羧基或羟烷基; Q表示二价 连接基团或单键; X表示阴离子）或包含下述通式（b1-9）表示的化合物的酸产生剂（B1'）（其中R402和R403各自独立地表示氢原子，烷基 基团或卤代烷基; R404表示烷基或卤代烷基，其中R403和R404可以彼此键合以形成环结构;并且X-表示阴离子）。

公开(公告)号：US20080311522A1

公开(公告)日：2008-12-18

申请号：US12135680

申请日：2008-06-09

申请人： Takeshi Iwai ,  Hideo Hada ,  Keita Ishiduka ,  Akiya Kawaue ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Tsuyoshi Nakamura ,  Komei Hirahara ,  Yuichi Suzuki ,  Takehiro Seshimo

发明人： Takeshi Iwai ,  Hideo Hada ,  Keita Ishiduka ,  Akiya Kawaue ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Tsuyoshi Nakamura ,  Komei Hirahara ,  Yuichi Suzuki ,  Takehiro Seshimo

IPC分类号： G03F7/004 ,  C07C309/04 ,  C07C69/74

CPC分类号： C07C309/06 ,  C07C309/04 ,  C07C309/10 ,  C07C381/12 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0397 ,  Y10S430/111 ,  Y10S430/123

摘要： A compound represented by general formula (b-14); and acid generator consisting of the compound; and a resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-14): wherein R7″ to R9″ each independently represents an aryl group or an alkyl group, wherein two of R7″ to R9″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R7″ to R9″ represents a substituted aryl group in which a portion or all of the hydrogen atoms are substituted with an alkoxyalkyloxy group or an alkoxycarbonylalkyloxy group; and X− represents an anion.

摘要翻译： 由通式（b-14）表示的化合物; 和由该化合物组成的酸发生剂; 以及抗蚀剂组合物，其包含在酸的作用下在碱性显影液中溶解度变化的碱成分（A）和暴露时产生酸的酸发生剂成分（B），所述酸发生剂成分（B）含有酸 发生器（B1）由通式（b1-14）表示的化合物组成：其中R7“至R9”各自独立地表示芳基或烷基，其中R7“至R9”中的两个可以键合 彼此形成具有硫原子的环，并且R 7“至R 9”中的至少一个表示取代的芳基，其中部分或全部氢原子被烷氧基烷氧基或烷氧基羰基烷氧基取代; X-表示阴离子。

公开(公告)号：US20080248422A1

公开(公告)日：2008-10-09

申请号：US12060695

申请日：2008-04-01

申请人： Takeshi Iwai ,  Hideo Hada ,  Masaru Takeshita ,  Akiya Kawaue ,  Keita Ishiduka ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Tsuyoshi Nakamura ,  Komei Hirahara ,  Yuichi Suzuki ,  Takehiro Seshimo ,  Kensuke Matsuzawa

发明人： Takeshi Iwai ,  Hideo Hada ,  Masaru Takeshita ,  Akiya Kawaue ,  Keita Ishiduka ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Tsuyoshi Nakamura ,  Komei Hirahara ,  Yuichi Suzuki ,  Takehiro Seshimo ,  Kensuke Matsuzawa

IPC分类号： G03F7/025 ,  C07D333/50

CPC分类号： C07D333/76 ,  G03F7/0045 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/123

摘要： A resist composition including a base component (A) and an acid-generator component (B), the acid-generator component (B) including an acid generator (B1) including a compound represented by general formula (b1-8) shown below (wherein R401 represents an acid dissociable, dissolution inhibiting group; R41 to R43 each independently represents a halogen atom, a halogenated alkyl group, an alkyl group, an acetyl group, an alkoxy group, a carboxy group or a hydroxyalkyl group; Q represents a divalent linking group or a single bond; and X− represents an anion) or an acid generator (B1′) including a compound represented by general formula (b1-9) shown below (wherein R403 and R403 each independently represents a hydrogen atom, an alkyl group or a halogenated alkyl group; R404 represents an alkyl group or a halogenated alkyl group, wherein R403 and R404 may be bonded to each other to form a ring structure; and X− represents an anion).

摘要翻译： 包含基础组分（A）和酸产生剂组分（B）的抗蚀剂组合物，所述酸产生剂组分（B）包括含有下述通式（b1-8）表示的化合物的酸产生剂（B1）（ 其中R 401表示酸解离的溶解抑制基团; R 41至R 43各自独立地表示卤素原子，卤代烷基， 烷基，乙酰基，烷氧基，羧基或羟烷基; Q表示二价连接基团或单键; X-O - 表示阴离子）或酸发生剂（ B1'），其包含如下所示的由通式（b1-9）表示的化合物（其中R 403和R 403）各自独立地表示氢原子，烷基或 卤代烷基; R 404表示烷基或卤代烷基，其中R 403和R 404可彼此键合至 形成一个戒指 结构; 而X - 代表阴离子）。

公开(公告)号：US07776510B2

公开(公告)日：2010-08-17

申请号：US12135680

申请日：2008-06-09

申请人： Takeshi Iwai ,  Hideo Hada ,  Keita Ishiduka ,  Akiya Kawaue ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Tsuyoshi Nakamura ,  Komei Hirahara ,  Yuichi Suzuki ,  Takehiro Seshimo

发明人： Takeshi Iwai ,  Hideo Hada ,  Keita Ishiduka ,  Akiya Kawaue ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Tsuyoshi Nakamura ,  Komei Hirahara ,  Yuichi Suzuki ,  Takehiro Seshimo

IPC分类号： G03F7/004 ,  G03F7/30 ,  C07C381/12

CPC分类号： C07C309/06 ,  C07C309/04 ,  C07C309/10 ,  C07C381/12 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0397 ,  Y10S430/111 ,  Y10S430/123

摘要： A compound represented by general formula (b-14); and acid generator consisting of the compound; and a resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-14): wherein R7″ to R9″ each independently represents an aryl group or an alkyl group, wherein two of R7″ to R9″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R7″ to R9″ represents a substituted aryl group in which a portion or all of the hydrogen atoms are substituted with an alkoxyalkyloxy group or an alkoxycarbonylalkyloxy group; and X− represents an anion.

摘要翻译： 由通式（b-14）表示的化合物; 和由该化合物组成的酸发生剂; 以及抗蚀剂组合物，其包含在酸的作用下在碱性显影液中溶解度变化的碱成分（A）和暴露时产生酸的酸发生剂成分（B），所述酸发生剂成分（B）含有酸 由通式（b1-14）表示的化合物构成的发光体（B1）：其中，R7“〜R9”各自独立地表示芳基或烷基，其中，R7“〜R9”中的2个可以相互键合而成 与硫原子形成环，并且R 7“至R 9”中的至少一个表示其中一部分或全部氢原子被烷氧基烷氧基或烷氧基羰基烷氧基取代的取代芳基; X-表示阴离子。