- 专利标题: Controlled vapor deposition of multilayered coatings adhered by an oxide layer
-
申请号: US11112664申请日: 2005-04-21
-
公开(公告)号: US07776396B2公开(公告)日: 2010-08-17
- 发明人: Boris Kobrin , Jeffrey D. Chinn , Romuald Nowak , Richard C. Yi
- 申请人: Boris Kobrin , Jeffrey D. Chinn , Romuald Nowak , Richard C. Yi
- 申请人地址: US CA San Jose
- 专利权人: Applied Microstructures, Inc.
- 当前专利权人: Applied Microstructures, Inc.
- 当前专利权人地址: US CA San Jose
- 代理机构: Martine Penilla & Gencarella, LLP
- 主分类号: C23C16/40
- IPC分类号: C23C16/40
摘要:
An improved vapor-phase deposition method and apparatus for the application of multilayered films/coatings on substrates is described. The method is used to deposit multilayered coatings where the thickness of an oxide-based layer in direct contact with a substrate is controlled as a function of the chemical composition of the substrate, whereby a subsequently deposited layer bonds better to the oxide-based layer. The improved method is used to deposit multilayered coatings where an oxide-based layer is deposited directly over a substrate and an organic-based layer is directly deposited over the oxide-based layer. Typically, a series of alternating layers of oxide-based layer and organic-based layer are applied.
公开/授权文献
信息查询
IPC分类: