发明授权
- 专利标题： Coating compositions for photoresists
- 专利标题（中）： 光刻胶的涂料组合物
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申请号： US11651090申请日： 2007-01-08
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公开(公告)号： US07776506B2公开(公告)日： 2010-08-17
- 发明人: Deyan Wang , Peter Trefonas, III , Michael K. Gallagher
- 申请人： Deyan Wang , Peter Trefonas, III , Michael K. Gallagher
- 申请人地址： US MA Marlborough
- 专利权人： Rohm and Haas Electronic Materials LLC
- 当前专利权人： Rohm and Haas Electronic Materials LLC
- 当前专利权人地址： US MA Marlborough
- 代理机构： Edwards Angell Palmer & Dodge LLP
- 代理商 Peter F. Corless; Darryl P. Frickey
- 主分类号： G03C1/76
- IPC分类号： G03C1/76 ; G03C1/492 ; G03C1/494 ; G03C5/00
摘要：
In one aspect, the present invention relates to coating compositions that comprise a resin component, wherein the predominant portion of the resin component comprising one or more resins that are at least substantially free of fluorine. Coating compositions of the invention are useful as photoresist overcoat layers, including in immersion lithography processing.
公开/授权文献
- US20070160930A1 Coating compositions for photoresists 公开/授权日：2007-07-12
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