Invention Grant
- Patent Title: Variable resistance memory device and method of manufacturing the same
- Patent Title (中): 可变电阻存储器件及其制造方法
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Application No.: US11865491Application Date: 2007-10-01
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Publication No.: US07808815B2Publication Date: 2010-10-05
- Inventor: Yu-hwan Ro , Byung-gil Choi , Woo-yeong Cho , Hyung-rok Oh
- Applicant: Yu-hwan Ro , Byung-gil Choi , Woo-yeong Cho , Hyung-rok Oh
- Applicant Address: KR Suwon-Si, Gyeonggi-Do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-Si, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2006-0097305 20061002
- Main IPC: G11C11/00
- IPC: G11C11/00

Abstract:
A variable resistance memory device includes a substrate, a plurality of active lines formed on the substrate, are uniformly separated, and extend in a first direction, a plurality of switching devices formed on the active lines and are separated from one another, a plurality of variable resistance devices respectively formed on and connected to the switching devices, a plurality of local bit lines formed on the variable resistance devices, are uniformly separated, extend in a second direction, and are connected to the variable resistance devices, a plurality of local word lines formed on the local bit lines, are uniformly separated, and extend in the first direction, a plurality of global bit lines formed on the local word lines, are uniformly separated, and extend in the second direction, and a plurality of global word lines formed on the global bit lines, are uniformly separated, and extend in the first direction.
Public/Granted literature
- US20080089105A1 Variable Resistance Memory Device and Method of Manufacturing the Same Public/Granted day:2008-04-17
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