发明授权
- 专利标题: End-block for a rotatable target sputtering apparatus
- 专利标题(中): 用于可旋转靶溅射装置的端块
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申请号: US11665563申请日: 2005-10-11
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公开(公告)号: US07824528B2公开(公告)日: 2010-11-02
- 发明人: Krist Dellaert , Wilmert De Bosscher , Joannes De Boever , Stijn Porteman
- 申请人: Krist Dellaert , Wilmert De Bosscher , Joannes De Boever , Stijn Porteman
- 申请人地址: BE Deinze
- 专利权人: Bekaert Advanced Coatings
- 当前专利权人: Bekaert Advanced Coatings
- 当前专利权人地址: BE Deinze
- 代理机构: Foley & Lardner LLP
- 优先权: EP04105116 20041018
- 国际申请: PCT/EP2005/055144 WO 20051011
- 国际公布: WO2006/042808 WO 20060427
- 主分类号: C25B9/00
- IPC分类号: C25B9/00 ; C25B13/00 ; C25B11/00 ; C23C14/00
摘要:
An end-block for electrically energising a rotatable tubular target in a vacuum coating installation is disclosed. The end-block has a rotary electrical contact that reduces the joule heating effects when operating in alternating current mode. When compared to known end-blocks, this is achieved by increasing the number of contact areas between a contacting ring and a series of circumferentially mounted contacting shoes. Also the contact shoes are being pressed radially outwardly by means of resilient elements against the contacting ring.
公开/授权文献
- US20080087541A1 End-Block for a Rotatable Target Sputtering Apparatus 公开/授权日:2008-04-17
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